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Preparation method of high-temperature-resistant high-infrared-emissivity coating

A technology with infrared emissivity and high temperature resistance, which is applied in coating, metal material coating process, molten spraying, etc., can solve the problems of low radiation heat dissipation capacity, short service life of coating, poor high temperature thermal shock performance, etc., and achieve Not easy to crack and peel off, strong coating adhesion and long service life

Inactive Publication Date: 2018-12-07
WUHAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above-mentioned oxide system still has problems such as low short-wave infrared radiation rate and poor high-temperature thermal shock performance; in the actual use process, there are problems such as short service life of the coating and low radiation and heat dissipation capacity, which greatly limit the coating performance. Protection of inner material

Method used

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  • Preparation method of high-temperature-resistant high-infrared-emissivity coating

Examples

Experimental program
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Effect test

Embodiment 1

[0026] A method for preparing a novel high-temperature-resistant high-infrared emissivity coating, comprising the steps of:

[0027] 1. Weigh 400g MoSi 2 Powder (particle size 1-2μm) and 100g SiC powder (particle size 500nm), add 500g deionized water, mix 5g binder, 1g defoamer and 2g dispersant, pour into the colloid mill and grind for 1 hour, then pump into the spray powder tower to complete the powder making process. During the granulation process, the air inlet temperature was set to 180°C, the air outlet temperature was set to 140°C, and the slurry feeding speed was 45ml min -1 , the rotation speed of atomizing disc is 25000~30000r·min -1 . The original powder is obtained after granulation;

[0028] 2. Put the obtained raw powder in an alumina crucible for atmosphere-protected roasting, the roasting temperature is 1400°C, the roasting time is 2 hours, and the protective atmosphere is Ar gas; after roasting, sieve to obtain 250-300 mesh thermal spray powder ;

[0029...

Embodiment 2

[0033] A method for preparing a novel high-temperature-resistant high-infrared emissivity coating, comprising the steps of:

[0034] 1. Weigh 450g MoSi 2 Powder (particle size 1-2μm) and 50g SiC powder (particle size 500nm), add 500g deionized water, mix 5g binder, 1g defoamer and 2g dispersant, pour into the colloid mill and grind for 1 hour, then pump into the spray powder tower to complete the powder making process. During the granulation process, the air inlet temperature was set to 180°C, the air outlet temperature was set to 140°C, and the slurry feeding speed was 45ml min -1 , the rotation speed of atomizing disc is 25000~30000r·min -1 , to obtain the original powder after granulation;

[0035] 2. Put the obtained raw powder in an alumina crucible for atmosphere-protected roasting, the roasting temperature is 1400°C, the roasting time is 2 hours, and the protective atmosphere is Ar gas; after roasting, sieve to obtain 250-300 mesh thermal spray powder ;

[0036] 3....

Embodiment 3

[0040] A method for preparing a novel high-temperature-resistant high-infrared emissivity coating, comprising the steps of:

[0041] 1. Weigh 350g MoSi 2 Powder (particle size 1-2μm) and 150g SiC powder (particle size 500nm), add 500g deionized water, mix 5g binder, 1g defoamer and 2g dispersant, pour into the colloid mill and grind for 1 hour, then pump Enter the spray powder making tower to complete the powder making process. During the granulation process, the air inlet temperature was set at 180°C, the air outlet temperature was set at 140°C, the slurry feeding speed was 45ml·min-1, and the rotation speed of the atomizing disc was 25000-30000r·min-1. The original powder is obtained after granulation;

[0042] 2. Put the obtained raw powder in an alumina crucible for atmosphere-protected roasting, the roasting temperature is 1400°C, the roasting time is 2 hours, and the protective atmosphere is Ar gas; after roasting, sieve to obtain 250-300 mesh thermal spray powder ; ...

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Abstract

The invention provides a preparation method a high-temperature-resistant high-infrared-emissivity coating. The preparation method comprises the following steps that different proportions of MoSi2 powder and SiC powder are evenly mixed with a binding agent, a defoaming agent and a dispensing agent, and then water is added to an obtained mixture to conduct grinding, so that uniform pulp with certainviscosity is obtained; spray granulation is conducted on the pulp, so that spray powder with a high degree of sphericity is obtained; the obtained powder is placed under an Ar atmosphere at the temperature of 1400 DEG C so as to be roasted for 2 hours, so that compact spherical powder is obtained; and the high-temperature-resistant high-infrared-emissivity coating is obtained on the surface of stainless steel subjected to roughing treatment through the atmospheric plasma spraying technique. The infrared radiation coating prepared through the thermal spraying method can achieve metallurgical bonding with a matrix and is high in bonding capacity and not prone to cracks and stripping, and the problem that it is different for infrared radiation ceramic to adhere to a metal matrix is solved; and meanwhile, the technical problems that an existing high-temperature infrared radiation coating is provided with a short-wave section low in infrared radiancy and is poor in thermal shock resistanceare also solved.

Description

technical field [0001] The invention belongs to the field of preparing functional coatings by thermal spraying, and in particular relates to a preparation method of a coating with high temperature resistance and high infrared emissivity. Background technique [0002] With the further development of modern industrial technology, the performance and functional requirements of materials are facing increasingly stringent challenges. The material surface is an important carrier of material performance and function, and the use of thermal spraying technology to modify and protect its surface has become a key development direction that has attracted much attention in the field of equipment manufacturing today. High temperature resistant infrared radiation coating is widely used in aerospace, smelting chemical industry, thermal power generation, nuclear industry and other fields because of its good high temperature resistance and excellent infrared radiation performance. [0003] A...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/10C23C4/134C23C4/129C23C4/126C23C4/073
CPCC23C4/10C23C4/073C23C4/126C23C4/129C23C4/134
Inventor 程旭东丁思宇毛家玮曾鲜
Owner WUHAN UNIV OF TECH
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