Apreparation method of SmCu alloy doped samarium-cobalt based nano composite permanent magnet
A nano-composite, permanent magnet technology, used in magnetic objects, metal processing equipment, magnetic materials, etc., can solve problems such as magnetic properties gap, achieve good magnetic properties, improve coercivity, and improve the effect of grain boundaries
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Embodiment 1
[0019] 1) Prepare the raw materials first, weigh the raw materials according to the following weight ratio: Sm: 20%, Ce: 6%, Co: 56%, Fe: 10%, Cu: 5%, Zr: 3%, mix the raw materials and carry out vacuum Melting, and then high-energy ball milling for 2 hours to make alloy powder;
[0020] 2) According to Sm 6 Cu 4 Alloy composition Weigh and mix each raw material, vacuum melt the mixed raw material, and then melt the melted Sm 6 Cu 4 After the alloy ingot is melted, it is poured into the magnetron sputtering target mold, and after cooling, it is ground and cut to obtain Sm 6 Cu 4 Alloy sputtering target;
[0021] 3) Using magnetron sputtering technology to make the Sm prepared in step (2) 6 Cu 4 The alloy target is plated with (Sm, Ce) prepared in step (1). 1 (Co, Fe, Cu, Zr) 5 A mixed powder is obtained on the alloy powder; the vacuum degree of the vacuum chamber during the sputtering process is 8×10 - 2 Pa, the magnetron sputtering current is 20A, and the magnetron ...
Embodiment 2
[0029] 1) Prepare the raw materials first, weigh the raw materials according to the following weight ratio: Sm: 25%, Ce: 2.5%, Co: 53.5%, Fe: 11%, Cu: 6%, Zr: 2%, mix the raw materials and vacuum Melting, and then high-energy ball milling for 3 hours to make alloy powder;
[0030] 2) According to Sm 6 Cu 4 Alloy composition Weigh and mix each raw material, vacuum melt the mixed raw material, and then melt the melted Sm 6 Cu 4 After the alloy ingot is melted, it is poured into the magnetron sputtering target mold, and after cooling, it is ground and cut to obtain Sm 6 Cu 4 Alloy sputtering target;
[0031] 3) Using magnetron sputtering technology to make the Sm prepared in step (2) 6 Cu 4 The alloy target is plated with (Sm, Ce) prepared in step (1). 1 (Co, Fe, Cu, Zr) 5 A mixed powder is obtained on the alloy powder; the vacuum degree of the vacuum chamber during the sputtering process is 8×10 - 2 Pa, the magnetron sputtering current is 20A, and the magnetron sputte...
Embodiment 3
[0039] 1) Prepare the raw materials first, weigh the raw materials according to the following weight ratio: Sm: 27%, Ce: 2.7%, Co: 50.8%, Fe: 11%, Cu: 5.5%, Zr: 3%, mix the raw materials and then vacuum Melting, and then high-energy ball milling for 4 hours to make alloy powder;
[0040] 2) According to Sm 6 Cu 4 Alloy composition Weigh and mix each raw material, vacuum melt the mixed raw material, and then melt the melted Sm 6 Cu 4 After the alloy ingot is melted, it is poured into the magnetron sputtering target mold, and after cooling, it is ground and cut to obtain Sm 6 Cu 4 Alloy sputtering target;
[0041] 3) Using magnetron sputtering technology to make the Sm prepared in step (2) 6 Cu 4 The alloy target is plated with (Sm, Ce) prepared in step (1). 1 (Co, Fe, Cu, Zr) 5 A mixed powder is obtained on the alloy powder; the vacuum degree of the vacuum chamber during the sputtering process is 8×10 - 2 Pa, the magnetron sputtering current is 20A, and the magnetron...
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