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A large area pulse magnetic filter device

A filtering device and pulse magnetic technology, which is applied in metal material coating process, vacuum evaporation coating, coating, etc., can solve the problems of easy arc breaking, high temperature, and impossibility of plating, etc., and achieve high tolerance, The effect of a high average state of charge

Active Publication Date: 2020-11-20
BEIJING NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But it has an important disadvantage, that is, the density of the deposited film is not high, there are micron-sized large particles, and the temperature-sensitive substrate is not suitable, etc.
Magnetic filter cathodic vacuum arc deposition technology is a new type of ion beam film preparation method developed in recent years. It uses magnetic filter technology to filter out large particles and neutral atoms generated by the arc source to obtain a pure plasma beam without large particles. It effectively overcomes the problems caused by the existence of large particles in the ordinary arc source deposition method, and the prepared film has excellent performance. However, the important disadvantage of the DC magnetic filtration deposition technology is that the temperature of the film layer is still high during deposition, and it is difficult for some substrates. Substrates that are extremely sensitive to temperature cannot be coated on the surface; at the same time, when coating some oxide film layers, it is very easy to cause arc breaks due to the easy poisoning of the target material, which is not conducive to the continuous deposition of the film layer
Moreover, when some materials with poor conductivity are used as cathodes, ordinary DC magnetic filtration cannot achieve the plating of this material.

Method used

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Effect test

Embodiment 1

[0051] Cathode size Φ25mm;

[0052] The trigger voltage is 15KV, the trigger frequency is 12Hz, and the pulse width is 100μs;

[0053] The lead-out electrode is 30mm away from the cathode surface, the aperture is Φ60mm, and the lead-out voltage is 300V;

[0054] Focusing straight tube: length 30mm, diameter Φ80mm, wire package current 100A, frequency 2KHz;

[0055] Magnetic filter pipe: the radius of curvature of the geometric center is 160mm, the diameter is Φ80mm, and the magnetic filter angle is 90 degrees; the transition line package: a constant DC is connected, and the current intensity is 8A; the bending line package: a strong pulse current is connected, the current intensity is 80A, The pulse frequency is 8KHz, the pulse width is 6000μs; the diffusion line package: the current intensity is 5A;

[0056] Diffusion pipe: the size is 30mm×250mm, the maximum lead-out side length is 250mm; the current of the transition line is 15A; the current intensity of the upper left an...

Embodiment 2

[0058] Cathode size Φ25mm;

[0059] The trigger voltage is 15KV, the trigger frequency is 12Hz, and the pulse width is 100μs;

[0060] The lead-out electrode is 30mm away from the cathode surface, the aperture is Φ60mm, and the lead-out voltage is 300V;

[0061] Focusing straight tube: length 30mm, diameter Φ80mm, wire package current 100A, frequency 2KHz;

[0062] Magnetic filter pipe: the radius of curvature of the geometric center is 160mm, the diameter is Φ80mm, and the magnetic filter angle is 90 degrees; the transition line package: a constant DC is connected, and the current intensity is 8A; the bending line package: a strong pulse current is connected, the current intensity is 80A, The pulse frequency is 8KHz, the pulse width is 6000μs; the diffusion line package: the current intensity is 5A;

[0063]Diffusion pipe: the size is 30mm×250mm, the maximum lead-out side length is 250mm; the current of the transition line is 15A; the current intensity of the upper left and...

Embodiment 3

[0065] Cathode size Φ25mm;

[0066] The trigger voltage is 15KV, the trigger frequency is 12Hz, and the pulse width is 100μs;

[0067] The lead-out electrode is 30mm away from the cathode surface, the aperture is Φ60mm, and the lead-out voltage is 300V;

[0068] Focusing straight tube: length 30mm, diameter Φ80mm, wire package current 100A, frequency 2KHz;

[0069] Magnetic filter pipe: the radius of curvature of the geometric center is 160mm, the diameter is Φ80mm, and the magnetic filter angle is 90 degrees; the transition line package: a constant DC is connected, and the current intensity is 8A; the bending line package: a strong pulse current is connected, the current intensity is 80A, The pulse frequency is 8KHz, the pulse width is 6000μs; the diffusion line package: the current intensity is 5A;

[0070] Diffusion pipe: the size is 30mm×250mm, the maximum lead-out side length is 250mm; the current of the transition line is 15A; the current intensity of the upper left an...

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Abstract

The invention discloses a large-area pulse magnetic filter device. The device comprises a pulse cathode arc head, an extraction electrode, a focusing straight pipe, a magnetic filter pipeline and an extension pipeline. Through implementing the device, the shapes of ion beam spots are apparently changed from original round beam spots to long strip-shaped beam spots, and the maximum beam spot size can be 60mm*260mm, so that the longitudinal widths of the ion beam spots are greatly improved and obvious advantages are provided when treatment is performed on the surfaces of long strip-shaped components. Meanwhile, the large-area pulse magnetic filter device is capable of realizing the plating of cathode material coatings with bad conductivity. Through matched using of the extraction electrode and the focusing electrode, the extracted beam flows are greatly increased; at the same time, the ion beam spot size can be greatly expanded under the cooperation of current of a diffusion pipeline anda magnetic filter pipeline; under the same beam flow strength, the lives of cathode target materials can be greatly prolonged.

Description

technical field [0001] The invention proposes a large-area pulse magnetic filter device for solving the problems of pulse magnetic filter ion beam uniformity, service life and the like. [0002] technical background [0003] With the rapid development of science and technology, the requirements for material surface modification technology are getting higher and higher, and the traditional single surface modification technology has become increasingly difficult to meet the technical requirements of industrial production; synthesis, integration and multi-function become the trend of technological development. [0004] In recent years, some surface modification composite technologies have come out and been put into the industry one after another, and play an important role. For example, the composite technology of magnetron sputtering technology and arc ion plating technology is compatible with the advantages of magnetron sputtering technology that can deposit large-area and hi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32
CPCC23C14/325
Inventor 廖斌欧阳晓平罗军庞盼左帅张旭吴先映张丰收韩然
Owner BEIJING NORMAL UNIVERSITY
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