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Preparation method of high adhesion hard protective film on zinc sulfide window

A high-adhesion, hard-protection technology, used in vacuum evaporation plating, coating, sputtering, etc., can solve problems such as poor adhesion, can not meet the requirements of anti-sand and dust, and achieve improved mechanical properties and stability Effects of Optical Constants, Stabilizing Deposition Rates

Active Publication Date: 2020-08-04
HUBEI JIUZHIYANG INFRARED SYST CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Hafnium oxynitride films have good transmittance in the visible light to long-wave infrared bands, and are suitable as multi-spectral coatings. Currently, it is reported in the literature that Beijing Institute of Nonferrous Metals uses N 2 and O 2 As a working gas, the hardness of hafnium oxynitride prepared by magnetron sputtering can reach 16GPa, but this hardness cannot meet the higher requirements of dust resistance.
Experimental studies have found that oxide and oxynitride films directly deposited on zinc sulfide substrates have poor adhesion

Method used

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  • Preparation method of high adhesion hard protective film on zinc sulfide window
  • Preparation method of high adhesion hard protective film on zinc sulfide window
  • Preparation method of high adhesion hard protective film on zinc sulfide window

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Embodiment 1

[0032] ZnS connecting layer plating: the zinc sulfide substrate is loaded into an ion beam assisted evaporation deposition coating machine, the ion source is turned on to bombard the surface of the zinc sulfide substrate with an ion beam, and the working gas is high-purity argon (purity 99.99%). The ion source parameters were set as follows: bias voltage 160V, discharge current 50A, duration 5 minutes; then deposit ZnS connection layer, deposition rate 0.20nm / s, physical thickness 40nm. Ion source parameter setting: bias voltage 125V, discharge current 50A, argon gas flow into the ion source is 15 sccm; after the deposition is completed, turn on the ion source to bombard the ZnS connection layer with ion beam, ion source parameter setting: bias voltage 150V, discharge current 30A, the working gas is high-purity argon (purity 99.99%) and high-purity oxygen (purity 99.99%), the flow rate of argon and oxygen is 20sccm / 30sccm, and the mixed ion beam is bombarded for 5 minutes.

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Abstract

The invention discloses a preparation method of a high-adhesion hard protective thin film on a zinc sulfide window. A connecting layer is formed by a high-purity zinc sulfide film in a vacuum thermalevaporation mode on a substrate, deposition is assisted through ion beams, and the thickness of the connecting layer is 20-60 nm; a matching layer is formed by a high-purity zinc oxide film in an electronic gun evaporation mode on the basis of the connecting layer, deposition is assisted through ion beams, and the thickness is 40-70 nm; the matching layer is placed into a high-temperature annealing furnace of an aerobic environment to be annealed; and preparation is conducted through a pulsed power supply non-equilibrium reaction magnetron sputtering technology, and the high-hardness HfOxNy protective thin film is deposited. The hardness of the HfOxNy thin film is further improved under the situation that the optical property is ensured, the matching problem of the HfOxNy thin film and thezinc sulfide substrate is solved, and the film-substrate firmness is improved.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and in particular relates to a preparation method of a high-adhesion hard protective thin film on a zinc sulfide window. Background technique [0002] The optical window is an optical component of the optical system that is in contact with the harsh external environment. While ensuring the optical performance, it has very strict requirements on the ability of the part to resist harsh environments. [0003] Zinc sulfide polycrystalline material has excellent optical and mechanical properties, and is an advanced multispectral window, hood and lens material. Although it has unique advantages in optical performance, this window material has poor mechanical properties and low hardness, only 2.3GPa. When used in harsh environments, its optical surface is easily damaged and the infrared transmittance drops sharply. lead to system failure. Therefore, in the actual use process, the surface of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/08C23C14/30C23C14/32
CPCC23C14/0057C23C14/0629C23C14/0676C23C14/086C23C14/30C23C14/32C23C14/3485C23C14/35
Inventor 薛俊姚细林张天行杨放
Owner HUBEI JIUZHIYANG INFRARED SYST CO LTD
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