Workpiece with high-density nano-diamond thin film on surface, and preparation method of high-density nano-diamond thin film

A nano-diamond and workpiece technology, applied in the field of nano-diamond, can solve the problems of many film defects and poor bonding force, and achieve the effects of high film quality, low cost, and improved nucleation density

Pending Publication Date: 2018-12-28
SHENZHEN INST OF ADVANCED TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of this, the present invention provides a method for preparing a high-density nano-diamond film to solve the difficulty in preparing a large-area nano-scale thickness diamond film on a micro-nano substrate with a complex shape in the prior art, and the prepared film has many defects. The problem of weak

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  • Workpiece with high-density nano-diamond thin film on surface, and preparation method of high-density nano-diamond thin film
  • Workpiece with high-density nano-diamond thin film on surface, and preparation method of high-density nano-diamond thin film

Examples

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Effect test

Embodiment 1

[0041] A preparation method of high-density nano-diamond film, comprising the following steps:

[0042] Step 1, take the silicon wafer substrate for surface pretreatment, so that the surface of the silicon wafer is negatively charged; first, the substrate is immersed in a temperature of 92°C and a ratio of NH 3 H 2 O:H 2 O:H 2 O 2 =10:50:10 (volume ratio) solution for 10 minutes, then the matrix was taken out, and ultrasonically cleaned in deionized water for 3 times, each time ultrasonic for 5 minutes;

[0043] Step 2: Prepare a nano-diamond suspension with positive charges on the surface of the diamond particles: add lysine to the water to prepare a lysine concentration of 5×10 -6 mol / L, the lysine solution of pH 7, adding the nano-diamond powder purchased on the market to the above-mentioned lysine solution, and ultrasonically dispersing to obtain a nano-diamond suspension with a mass concentration of 0.005% of the nano-diamond particles ;

[0044] Step 3, put the sub...

Embodiment 2

[0050] A preparation method of high-density nano-diamond film, comprising the following steps:

[0051] Step 1, take the silica substrate for surface pretreatment, so that the surface of the substrate is negatively charged: first, the substrate is immersed in a temperature of 82 ° C and a ratio of NH 3 H 2 O:H 2 O:H 2 O 2 =10:50:10 (volume ratio) solution for 10 minutes, then take out the matrix, ultrasonically clean it in deionized water for 3 times, each time ultrasonic for 5 minutes;

[0052] Step 2: Prepare a nano-diamond suspension with positive charges on the surface of the diamond particles: add lysine to the water to prepare a lysine concentration of 5×10 -6 mol / L, the lysine solution of pH 4, adding the nano-diamond powder purchased on the market to the above-mentioned lysine solution, and ultrasonically dispersing to obtain a nano-diamond suspension with a mass concentration of 0.005% of the nano-diamond particles ;

[0053] Step 3, put the substrate pretreated...

Embodiment 3

[0057] A preparation method of high-density nano-diamond film, comprising the following steps:

[0058] Step 1, take a silicon carbide substrate for surface pretreatment to make the surface of the substrate negatively charged: ultrasonically clean the substrate in acetone, alcohol and deionized water for 15 minutes in sequence.

[0059] Step 2: Prepare a nano-diamond suspension with positive charges on the surface of the diamond particles: add lysine to the water to prepare a lysine concentration of 5×10 -6 mol / L, a lysine solution with a pH of 3, adding the nano-diamond powder purchased on the market to the above-mentioned lysine solution, and ultrasonically dispersing to obtain a nano-diamond suspension with a mass concentration of 0.05% of the nano-diamond particles ;

[0060] Step 3, put the substrate pretreated in step 1 into the nano-diamond suspension prepared in step 2, ultrasonically vibrate for 30 minutes, and the power is 280W, so that the nano-diamond particles ar...

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Abstract

The invention provides a preparation method of a high-density nano-diamond thin film. The preparation method comprises the steps that a workpiece substrate is subjected to surface pretreatment to enable the surface of the workpiece substrate to be positively charged or negatively charged; lysine is added into water to obtain a lysine solution, then nano-diamond powder is added into the lysine solution, and nano-diamond suspension liquid with the positively or negatively charged nano-diamond particle surface is obtained after ultrasonic dispersion; the workpiece substrate subjected to surface pretreatment is immersed into the nano-diamond suspension liquid with the opposite charge to the workpiece substrate, and ultrasonic oscillation is conducted, so that nano-diamond particles are adsorbed on the surface of the workpiece substrate; and after adsorption is completed, the workpiece substrate is taken out, cleaned and blow-dried through nitrogen, and then the diamond thin film is grown on the workpiece substrate through chemical vapor deposition equipment. According to the preparation method, the large-area nanometer-thickness high-density nano-diamond thin film can be prepared on acomplex workpiece, the thin film is high in quality and high in bonding force, the technology is simple, the cost is low, and the preparation method has broad application prospects in a nano-electromechanical system.

Description

technical field [0001] The invention relates to the technical field of nano-diamonds, in particular to a workpiece with a high-density nano-diamond film on the surface and a preparation method of the high-density nano-diamond film. Background technique [0002] Due to its high melting point, high thermal conductivity, high hardness, good insulation, strong corrosion resistance, small dielectric constant, wide-bandgap semiconductor characteristics and good chemical stability, diamond film is used in wear-resistant coatings, biological Many high-tech fields such as medicine, thin-film microsensors, and nano-electromechanical systems have broad application prospects. At present, in order to obtain high-quality diamond films, diamond nano-powders are usually used to coat and pre-treat the substrate to increase the nucleation density of diamond films in different substrate materials. Form size constraints are a big problem. In addition, in nano-electromechanical systems, the th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27C23C16/02
CPCC23C16/02C23C16/27
Inventor 唐永炳王陶黄磊
Owner SHENZHEN INST OF ADVANCED TECH
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