Surface treatment method for improving welding properties of Si3N4 ceramic and gamma-TiAl alloy
A technology for surface treatment and welding performance, which is applied in the field of surface treatment to improve the welding performance of Si3N4 ceramics and γ-TiAl alloys. The effect of surface energy
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Embodiment 1
[0046] Embodiment 1: prepare the material used for welding, process according to the following steps:
[0047] (1) Put the γ-TiAl alloy and the Ni target into the double-glow plasma surface alloying device, use the γ-TiAl alloy as the workpiece electrode, and use the pure Ni target material (99.95wt%) as the source electrode;
[0048] (2) Vacuumize to the ultimate vacuum, send in argon, start the glow, first clean the target and γ-TiAl alloy, and prepare the nickel alloy layer after cleaning, the steps are as follows:
[0049] (2a) Low-temperature bombardment of the target (plasma cleaning) for 30 minutes to remove scale and impurities on the surface of the target. The process parameters are as follows:
[0050] Target voltage: 650V;
[0051] Workpiece voltage: 0V;
[0052] Argon pressure: 20Pa;
[0053] Distance between target and workpiece: 20mm;
[0054] Cleaning time: 30min;
[0055] (2b) Adjust the voltage of the target to zero, and continue bombarding the γ-TiAl all...
Embodiment 2
[0071] Embodiment 2: prepare the material used for welding, process according to the following steps:
[0072] (1) Put the γ-TiAl alloy and the Ni target into the double-glow plasma surface alloying device, use the γ-TiAl alloy as the workpiece electrode, and use the pure Ni target material (99.95wt%) as the source electrode;
[0073] (2) Vacuumize to the ultimate vacuum, send in argon, start the glow, first clean the target and γ-TiAl alloy, and prepare the nickel alloy layer after cleaning, the steps are as follows:
[0074] (2a) Low-temperature bombardment of the target (plasma cleaning) for 30 minutes to remove scale and impurities on the surface of the target. The process parameters are as follows:
[0075] Target voltage: 750V;
[0076] Workpiece voltage: 0V;
[0077] Argon pressure: 25Pa;
[0078] Distance between target and workpiece: 15mm;
[0079] Cleaning time: 30min;
[0080] (2b) Adjust the voltage of the target to zero, and continue bombarding the γ-TiAl all...
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