Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Synthesis of a Polymer Acrylate Resin with Photosensitive Autocatalytic Activity

An acrylate and self-catalyzed technology, applied in non-polymer adhesive additives, non-polymer organic compound adhesives, adhesive additives, etc., can solve poor surface dryness, poor toughness of cured products, and flexible adhesive layer sex issues

Active Publication Date: 2021-02-09
YANTAI DARBOND TECH
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, acrylate light-curable adhesives also have their own unavoidable shortcomings, such as poor surface dryness caused by oxygen inhibition on the surface of the adhesive layer after curing, poor flexibility of the adhesive layer, and many other problems.
In order to solve the above shortcomings, rubber toughening resins are widely used in acrylate light-curable adhesives, but the current common rubber tougheners only improve the toughness of the cured adhesive layer, and need to add small molecule photoinitiators to the light-curing system. Accelerator accelerator, even so, can not balance the problem of poor toughness and poor surface drying of acrylate light-curable adhesive cured products

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Synthesis of a Polymer Acrylate Resin with Photosensitive Autocatalytic Activity
  • Synthesis of a Polymer Acrylate Resin with Photosensitive Autocatalytic Activity
  • Synthesis of a Polymer Acrylate Resin with Photosensitive Autocatalytic Activity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Take 430g of hydroxyl-terminated polybutadiene liquid rubber, add 30g of tert-butyldiphenylchlorosilane and 0.5g of diethyltetramethylimidazole under nitrogen protection, and react at 30°C for 4 hours to obtain silicon ether-protected rubber at both ends. the pretreatment;

[0029] Add the above-mentioned reactant to 22 g of HBr with a concentration of 40%, and react at 70° C. for 3 hours to obtain a halogenated hydrocarbon protected by silicon ether at both ends;

[0030] Add 55 g of N-methyl-N-hydroxyethyl-p-toluidine (CAS No. 2842-44-6) to the halogenated hydrocarbon protected with silicon ether at both ends prepared above, and react at 30°C under nitrogen protection for 3 hours;

[0031] Dissolve the product of the third step in tetrahydrofuran (THF) solvent, add catalyst tetraalkylammonium fluoride (TBAF) 0.26g, react at 25°C for 3-4h, and finally remove the solvent THF by rotary evaporation; after the above rotary evaporation The obtained product was vacuumized a...

Embodiment 2

[0033] Take 430g of hydroxyl-terminated polybutadiene liquid rubber, add 35g of tert-butyldiphenylchlorosilane and 1.5g of diethyltetramethylimidazole under nitrogen protection, and react at 40°C for 2 hours to obtain silicon ether-protected rubber at both ends. the pretreatment;

[0034] Add the above reactant to 20 g of HBr with a concentration of 40%, and react at 70°C for 3 hours to obtain a halogenated hydrocarbon protected by silicon ether at both ends;

[0035] Add 70 g of N-methyl-N-hydroxyethyl-p-toluidine (CAS No. 2842-44-6) to the halogenated hydrocarbon protected with silicon ether at both ends prepared above, and react at 30°C under nitrogen protection for 3 hours;

[0036] Dissolve the product of the third step in tetrahydrofuran (THF) solvent, add catalyst tetraalkylammonium fluoride (TBAF) 0.50g, react at 25°C for 3-4h, and finally remove the solvent THF by rotary evaporation; The obtained product was vacuumized at 110°C for 3 hours to remove moisture and othe...

Embodiment 3

[0038] Take 430g of hydroxyl-terminated polybutadiene liquid rubber, add 30g of tert-butyldiphenylchlorosilane and 1.0g of diethyltetramethylimidazole under nitrogen protection, and react at 40°C for 4 hours to obtain silicon ether-protected rubber at both ends. the pretreatment;

[0039] Add the above-mentioned reactant to 26 g of 40% HBr, and react at 70°C for 3 hours to obtain a halogenated hydrocarbon protected by silicon ether at both ends;

[0040] Add 48 g of N-methyl-N-hydroxyethyl-p-toluidine (CAS No. 2842-44-6) to the halogenated hydrocarbon protected with silicon ether at both ends prepared above, and react at 30°C under nitrogen protection for 3 hours;

[0041]Dissolve the product of the third step in tetrahydrofuran (THF) solvent, add catalyst tetraalkylammonium fluoride (TBAF) 0.38g, react at 25°C for 3-4h, and finally remove the solvent THF by rotary evaporation; after the above rotary evaporation The obtained product was vacuumized at 113°C for 2.5 hours to re...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
storage modulusaaaaaaaaaa
Login to View More

Abstract

The invention relates to the synthesis of a polymer acrylate resin with photosensitive autocatalytic activity. The synthesis steps include: adding tert-butyldiphenylchlorosilane and catalyst diethyl silane to hydroxyl-terminated polybutadiene liquid rubber under nitrogen protection. Tetramethylimidazole, then react with HBr for 3-4h, and react with active units containing tertiary amine structure at 30°C under nitrogen protection for 3-5h, the product is dissolved in tetrahydrofuran solvent, add catalyst tetraalkylammonium fluoride, and remove the solvent by rotary evaporation , add isocyanate, and finally add hydroxyl-containing acrylate and react at 70-80°C for 1-3 hours to obtain a photosensitive autocatalytic polymer acrylate resin. The acrylate resin of the present invention has the advantages of improving the toughness of the acrylate light-curing adhesive after curing and improving surface dryness.

Description

technical field [0001] The invention relates to the synthesis of a high molecular weight acrylate resin with photosensitive self-catalysis activity, which belongs to the field of light-curing materials. [0002] technical background [0003] Acrylic light-curing adhesives are suitable for bonding glass, plastic or metal. The cured product has good transparency and fast curing speed, which can realize many advantages such as automatic production line and high productivity, and is widely used in electronic and electrical industries. However, acrylate light-curable adhesives also have their own unavoidable shortcomings, such as poor surface dryness caused by oxygen inhibition on the surface of the adhesive layer after curing, poor flexibility of the adhesive layer, and many other problems. In order to solve the above shortcomings, rubber toughening resins are widely used in acrylate light-curable adhesives, but the current common rubber tougheners only improve the toughness of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08G18/67C08G18/69C08G18/73C09J4/06C09J11/04C09J11/06C08C19/25C08C19/16C08C19/22
CPCC08C19/16C08C19/22C08C19/25C08G18/672C08G18/73C09J4/06C09J11/04C09J11/06C08G18/696
Inventor 陈加立王建斌陈田安
Owner YANTAI DARBOND TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com