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Novel IGZO (indium gallium zinc oxide) etching liquid for panel display array process

An array manufacturing process and flat panel display technology, which is applied in the direction of surface etching composition, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of low etching rate, easy residue, insufficient side engraving, etc., and achieve excellent etching accuracy, Good etching effect and high etching rate

Inactive Publication Date: 2019-03-08
SUZHOU BOYANG CHEM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Using the above-mentioned published patent to etch the new IGZO material containing four elements has defects such as low etching rate, insufficient side engraving, and easy residue, which cannot meet the mass production requirements in the actual use process

Method used

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  • Novel IGZO (indium gallium zinc oxide) etching liquid for panel display array process
  • Novel IGZO (indium gallium zinc oxide) etching liquid for panel display array process
  • Novel IGZO (indium gallium zinc oxide) etching liquid for panel display array process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Ratio of each raw material:

[0023] Sulfuric acid 5%, nitric acid 2%, acetic acid 2%, fluoride 0.5%, butanol random polyether BPE1500 (surfactant) 500ppm and the balance ultrapure water.

[0024] Specific preparation method:

[0025] Under normal temperature and pressure, add the raw materials of the formula quantity into the mixing kettle in turn; mix to a uniform and stable aqueous solution; filter with a filter, and then fill it into the designated packaging container.

Embodiment 2

[0027] Ratio of each raw material:

[0028] Sulfuric acid 5%, nitric acid 5%, acetic acid 5%, fluoride 0.1%, isomeric decanol ether XP-70 (surfactant) 100ppm and the balance ultrapure water.

[0029] Specific preparation method:

[0030] Under normal temperature and pressure, add the raw materials of the formula quantity into the mixing kettle in turn; mix to a uniform and stable aqueous solution; filter with a filter, and then fill it into the designated packaging container.

Embodiment 3

[0032] Ratio of each raw material:

[0033] Sulfuric acid 10%, nitric acid 10%, acetic acid 10%, fluoride 0.1%, glycerol random polyether GPE3000 (surfactant) 900ppm and balance ultrapure water.

[0034] Specific preparation method:

[0035] Under normal temperature and pressure, add the raw materials of the formula quantity into the mixing kettle in turn; mix to a uniform and stable aqueous solution; filter with a filter, and then fill it into the designated packaging container.

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PUM

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Abstract

The invention relates to novel IGZO (indium gallium zinc oxide) etching liquid for a panel display array process. The novel IGZO etching liquid comprises, in weight percent, 1-10% of sulfuric acid, 0.5-10% of nitric acid, 0.5-10% of acetic acid, 0.1-0.6% of fluoride, 5ppm-1000ppm of surfactants and the balance ultra-pure water. The etching liquid functions in effectively etching novel anti-corrosion IGZO materials, is high in etching rate, small in side etching amount and free from etching residues, and meets mass production process requirements.

Description

technical field [0001] The invention relates to the technical field of flat panel display, in particular to a novel IGZO etchant for a flat panel display array manufacturing process. Background technique [0002] IGZO (indium gallium zinc oxide) is the abbreviation of indium gallium zinc oxide. Amorphous IGZO material is a channel layer material used in the new generation of thin film transistor technology and is a kind of metal oxide (Oxied) panel technology. There is a new type of IGZO material, that is, on the basis of traditional IGZO, the fourth metal element Sn (tin) is added, and the IGZO with the new element is baked at a high temperature above 400°C, with superior performance and greatly improved corrosion resistance. It can increase the application range of IGZO and prolong the service life; for this kind of special new material, there is no special etching solution at present. [0003] The patent with the publication number CN 108265296 A provides an etching solu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K13/08H01L21/306
CPCC09K13/08H01L21/30604
Inventor 王润杰李华平郑李辉卢洪庆陈文波
Owner SUZHOU BOYANG CHEM
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