Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride

A technology for detecting sensitivity and hydrogen chloride, applied in measuring devices, instruments, scientific instruments, etc., can solve the problems of only tens of PPM-0.1PPM, can not meet the requirements of electronic-grade hydrogen chloride analysis, etc., and achieve the effect of low detection limit and high sensitivity

Active Publication Date: 2021-03-16
ZHEJIANG BRITECH CO LTD
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

2. The detectors used in conventional gas chromatography methods generally have an analytical sensitivity of only a few tens of PPM-0.1PPM
[0006] At present, gas chromatography technology has been used as a routine detection method for gas components, but this method can only meet the constant analysis, only suitable for the composition analysis of pure hydrogen chloride, and cannot meet the analysis requirements of electronic grade hydrogen chloride

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] A method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride, the technical scheme of which is as follows:

[0020] The method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride is realized by modifying the chromatographic sampling system, flow system and detector. The sampling system includes a sample inlet, a sample outlet, a quantitative tube, a carrier gas Inlet and carrier gas outlet; six nozzles are arranged counterclockwise and evenly distributed on the same circle, and matched with the six-way valve; the flow system described is a flow system for parallel analysis of chromatographic columns; it includes a sample injection tube, two parallel injection valves connected thereto, and a chromatographic column installed after the injection valve; the two chromatographic columns are respectively in different control column boxes, and the temperature can be adjusted separately; it is c...

Embodiment 2

[0029] A method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride, the technical scheme of which is as follows:

[0030]The method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride is realized by modifying the chromatographic sampling system, flow system and detector. The sampling system includes a sample inlet, a sample outlet, a quantitative tube, a carrier gas Inlet and carrier gas outlet; six nozzles are arranged counterclockwise and evenly distributed on the same circle, and matched with the six-way valve; the flow system described is a flow system for parallel analysis of chromatographic columns; it includes a sample injection tube, two parallel injection valves connected thereto, and a chromatographic column installed after the injection valve; the two chromatographic columns are respectively in different control column boxes, and the temperature can be adjusted separately; it is ch...

Embodiment 3

[0039] A method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride, the technical scheme of which is as follows:

[0040] The method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride is realized by modifying the chromatographic sampling system, flow system and detector. The sampling system includes a sample inlet, a sample outlet, a quantitative tube, a carrier gas Inlet and carrier gas outlet; six nozzles are arranged counterclockwise and evenly distributed on the same circle, and matched with the six-way valve; the flow system described is a flow system for parallel analysis of chromatographic columns; it includes a sample injection tube, two parallel injection valves connected thereto, and a chromatographic column installed after the injection valve; the two chromatographic columns are respectively in different control column boxes, and the temperature can be adjusted separately; it is c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Sensitivityaaaaaaaaaa
Sensitivityaaaaaaaaaa
Sensitivityaaaaaaaaaa
Login to View More

Abstract

The invention relates to the field of high-purity gas impurity detection and specifically relates to a method for increasing detection sensitivity of special impurities in high-purity hydrogen chloride. According to the method for increasing detection sensitivity of special impurities in high-purity hydrogen chloride disclosed by the invention, two parallel chromatographic columns are used; an independent temperature-control column box is adopted, so that column temperatures of the two parallel chromatographic columns can be guaranteed, and such an arrangement is beneficial to respectively separated components; a helium ion detector is used for detecting trace impurities and the limit of detection can be reduced to 1-10ppb; a filler special for high-purity hydrogen chloride chromatographicanalysis and nanometer titanium dioxide are adopted for modifying a capillary column, so that the separation of trace impurities in electronic hydrogen chloride can be boosted; the helium ion detector is used for detecting hydrogen chloride according to the method, so that the sensitivity is high and the limit of detection is low; impurity component response is linear; after a gas flow is designed, sample can be injected at one time and the requirements for analyzing all the impurities of electronic hydrogen chloride gas can be met.

Description

technical field [0001] The invention relates to the field of high-purity gas impurity detection, in particular to a method for improving the detection sensitivity of special impurities in high-purity hydrogen chloride. Background technique [0002] With the development of the electronics industry towards large size, high integration, high uniformity and high integrity, it is required that the electronic grade hydrogen chloride used for vapor phase polishing of single crystal silicon wafers and corrosion of epitaxial frame should not only have a purity of more than 99.999%, Moreover, the lower the content of organic impurities such as THC, moisture and metal ions, the better. [0003] CN101839878A relates to a method and device for analyzing trace gaseous impurities in high-purity gas (or electronic gas). 1. The traditional refrigeration method can only be measured to -60--70°C. The invention adopts the immersion refrigeration method and reduces the cooling rate of the mirr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N30/02G01N30/06
CPCG01N30/02G01N30/06
Inventor 李军陈刚张学良夏添杨建成徐建仙张广第吴艳军李金娥
Owner ZHEJIANG BRITECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com