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High-flux material synthesis and synchronous radiation light source high-flux representing method of composite material chip

A technology of combining material chips and synthesis methods, which is applied in the fields of analyzing materials, material analysis using wave/particle radiation, and measuring devices, etc., can solve problems such as wasting time, and achieve the effect of saving sample production time.

Active Publication Date: 2019-04-26
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The synchrotron radiation light source has high brightness, wide spectrum (continuous energy spectrum from very far infrared to X-ray), high purity (synchrotron radiation light is generated in an ultra-high vacuum without any pollution caused by impurities), high The characteristics and advantages of collimation and time structure (pulse time structure and other characteristics) can perform high-energy and high-precision XRD characterization, but most workstations can only perform single-sample characterization, and the sample replacement process wastes a lot of time

Method used

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  • High-flux material synthesis and synchronous radiation light source high-flux representing method of composite material chip
  • High-flux material synthesis and synchronous radiation light source high-flux representing method of composite material chip
  • High-flux material synthesis and synchronous radiation light source high-flux representing method of composite material chip

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Effect test

Embodiment 1

[0036] 1.(Lu 1-x Sc x ) 0.99 Ce 0.01 BO 3 Sample combination material chip production

[0037] In this embodiment, referring to Figures 3 and 7, a high-throughput material synthesis method based on a combined material chip can prepare materials with a multi-component concentration gradient at one time, and the addition amount of each component material can be accurate Control ≤±1μL, prepare precursor by chemical method, and conduct high temperature heat treatment, the steps are as follows:

[0038] a. Raw material preparation: use Lu(NO) with a concentration of 1mol / L 3 ) 3 , Sc(NO 3 ) 3 , Ce(NO 3 ) 3 And the concentration of 0.9mol / L H 3 BO 3 As the sample raw material standard solution, citric acid with a concentration of 1mol / L is used as the complexing agent;

[0039] b. Add the above-mentioned standard solution to different storage tanks of the raw material bin of the combined material instrument. Use a porous quartz substrate with 50 reaction chambers as the reaction container....

Embodiment 2

[0056] This embodiment is basically the same as the first embodiment, and the special features are:

[0057] 1.(Lu 1-x Y x ) 0.99 Ce 0.01 BO 3 Sample combination material chip production

[0058] In this embodiment, see Figure 4, Image 6 As shown in Figure 7, a high-throughput material synthesis method based on a combined material chip can prepare multi-component concentration gradient materials at one time, and the addition amount of each component material can be accurately controlled ≤±1μL, prepared by chemical methods Precursor, and high temperature heat treatment, the steps are as follows:

[0059] a. Raw material preparation: use Lu(NO) with a concentration of 1mol / L 3 ) 3 , Y(NO 3 ) 3 , Ce(NO 3 ) 3 And the concentration of 0.9mol / L H 3 BO 3 As the sample raw material standard solution, citric acid with a concentration of 1mol / L is used as the complexing agent;

[0060] b. Add the above-mentioned standard solution to different storage tanks of the raw material bin of the combin...

Embodiment 3

[0074] This embodiment is basically the same as the previous embodiment, and the special features are:

[0075] 1.(Lu 0.8 Sc 0.2 ) 1-x Ce x BO 3 Sample combination material chip production

[0076] In this embodiment, see Figure 4, Image 6 As shown in Figure 7, a high-throughput material synthesis method based on a combined material chip can prepare multi-component concentration gradient materials at one time, and the addition amount of each component material can be accurately controlled ≤±1μL, prepared by chemical methods Precursor, and high temperature heat treatment, the steps are as follows:

[0077] a. Raw material preparation: use Lu(NO) with a concentration of 1mol / L 3 ) 3 , Sc(NO 3 ) 3 , Ce(NO 3 ) 3 And the concentration of 0.9mol / L H 3 BO 3 As the sample raw material standard solution, citric acid with a concentration of 1mol / L is used as the complexing agent;

[0078] b. Add the above standard solutions to the different storage tanks of the raw material bin of the combined...

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Abstract

The invention discloses a high-flux material synthesis and synchronous radiation light source high-flux representing method of a composite material chip. A preparation method of the chemical compositematerial chip and a high-flux material preparation and representation combination system combined with synchrotron radiation light source X-ray diffraction station high-flux representation are utilized. Metal alkoxide, nitrate, acetate and chloride can be adopted as raw materials. According to the method, hundreds or thousands of samples can be prepared through a chemical method at a time, and the number of the samples can be regulated and controlled according to experiment needs. The crystal structure of the material can be fast and efficiently tested and analyzed through a synchronous radiation X-ray diffraction station high-flux representation automation platform. According to the preparation and representation system formed by combining a chemical composite material chip method and the high-flux representation automation platform, the preparation and representation speed of an inorganic material can be greatly increased, and the utilization efficiency of a synchronous radiation light source can be improved.

Description

Technical field [0001] The invention relates to a method for preparing and characterizing batch materials, in particular to a method for preparing high-flux materials and characterizing a synchrotron radiation light source, which is applied to the technical field of new material synthesis and detection. Background technique [0002] The combined material chip can realize the high-throughput preparation of materials, that is, on a small substrate or sample stage, through delicate design, with any element as the basic unit, it can combine and integrate up to hundreds or thousands of different components, structures, Material equivalent material sample library, and use high-throughput characterization methods to quickly obtain material composition, structure, performance and other information, with a substantial increase in experimental throughput to achieve a fundamental improvement in research efficiency, which can greatly improve the research progress of multi-system materials . ...

Claims

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Application Information

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IPC IPC(8): G01N23/20008G01N23/20033G01N23/20058
CPCG01N23/20008G01N23/20033G01N23/20058
Inventor 张志军王禹杨昕昕杨铁莹冯振杰高兴宇赵景泰
Owner SHANGHAI UNIV
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