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A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas and its preparation method

A laser device, high-reflection film technology, applied in coating, sputtering, metal material coating process, etc., can solve problems such as poor bonding force, difficult thickness control, etc., to achieve stable performance, reduce stress concentration, and combine strong effect

Inactive Publication Date: 2021-10-08
HENAN MECHANICAL & ELECTRICAL VOCATIONAL COLLEGE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] Using lipid hydrolysis method, the thickness prepared by this method is not easy to control; the bonding force prepared by electron beam evaporation coating method is poor, TiO 2 / SiO 2 The energy is around 10ev

Method used

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  • A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas and its preparation method
  • A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas and its preparation method
  • A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0043] The specific steps of the above-mentioned method for preparing a high-reflection film layer for laser devices resistant to high temperature and strong acid corrosion in exhaust gas are as follows:

[0044] 1) Substrate preparation: polishing the substrate;

[0045] 2) Ti film coating by magnetron sputtering: coating Ti film on the surface of Ti alloy substrate;

[0046] 3) Ag coating: Coating a reflective Ag coating on the Ti coating;

[0047] 4) TiO plating 2 Membrane: TiO coating with high transmission film on Ag film 2 membrane;

[0048] 5) SiO plating 2 Membrane: on TiO 2 Coated with high reflective film SiO on the film 2 membrane;

[0049] 6) Alternate coating: TiO 2 film with SiO 2 The membranes were alternated for 8 cycles, and at the end of the 4th cycle, the SiO 2 Coating Ag film on the film, then coating TiO on the Ag film 2 film, TiO 2 Coated SiO on film 2 Membrane... Alternate the remaining 4 cycles, with the final layer of SiO 2 TiO 2 membran...

Embodiment 1

[0063] A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas, including a substrate, a Ti film is coated on the substrate, an Ag film is coated on the Ti film, and TiO is coated on the Ag film 2 film, TiO 2 Coated SiO on film 2 film, SiO 2 TiO coating on film 2 film, TiO 2 film with SiO 2 The membranes were alternated for 4 cycles, and at the end of the 4th cycle, the SiO 2 Coating Ag film on the film, then coating TiO on the Ag film 2 film, TiO 2 Coated SiO on film 2 Membrane... 4 more cycles alternated, with the final layer of SiO 2 TiO 2 film, and prepare a high reflective film layer for laser devices.

[0064] The matrix is ​​Ti-6Al-4V alloy.

[0065] The thickness of the Ti film is 20nm, Ag film, TiO 2 film and SiO 2 The film thicknesses were all 500 nm.

[0066] The thickness of the substrate is 500 μm.

[0067] The specific steps of the above-mentioned method for preparing a hig...

Embodiment 2

[0078] A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas, including a substrate, a Ti film is coated on the substrate, an Ag film is coated on the Ti film, and TiO is coated on the Ag film 2 film, TiO 2 Coated SiO on film 2 film, SiO 2 TiO coating on film 2 film, TiO 2 film with SiO 2 The membranes were alternated for 4 cycles, and at the end of the 4th cycle, the SiO 2 Coating Ag film on the film, then coating TiO on the Ag film 2 film, TiO 2 Coated SiO on film 2 Membrane... 4 more cycles alternated, with the final layer of SiO 2 TiO 2 film, and prepare a high reflective film layer for laser devices.

[0079] The matrix is ​​Ti-6Al-4V alloy.

[0080] The thickness of the Ti film is 22nm, the thickness of the Ag film is 620nm, and the TiO 2 The thickness of the film is 550nm, SiO 2 The thickness of the film was 600 nm.

[0081] The thickness of the substrate is 550 μm.

[0082] The...

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Abstract

The invention discloses a high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas, which comprises a substrate, a Ti film is coated on the substrate, an Ag film is coated on the Ti film, and TiO is coated on the Ag film. 2 film, TiO 2 Coated SiO on film 2 film, SiO 2 TiO coating on film 2 film, TiO 2 film with SiO 2 The membranes were alternated for 4 cycles, and at the end of the 4th cycle, the SiO 2 Coating Ag film on the film, then coating TiO on the Ag film 2 film, TiO 2 Coated SiO on film 2 Membrane... 4 more cycles alternated, with the final layer of SiO 2 TiO 2 film, and prepare a high reflective film layer for laser devices. The high-reflection film layer prepared by the invention is resistant to high temperature, resistant to stress caused by air flow temperature changes, resistant to strong acid corrosion in exhaust gas, and has stable performance. TiO prepared by magnetron sputtering 2 / SiO 2 The binding force is strong, the ion energy is about 100ev, and the thickness of the film layer can be precisely controlled according to the process.

Description

technical field [0001] The invention belongs to the technical field of optical reflection films, and in particular relates to a high-reflection film for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas and a preparation method thereof. Background technique [0002] Ultrashort pulse laser is widely used in biomedicine, military, environmental monitoring, industrial processing and other fields, which has aroused great research interest. In recent years, laser technology has become more and more widely used in industrial production. In the process of laser technology preparation, the technical requirements for the preparation of laser reflective films and related devices are getting higher and higher. For the film system with multiple reflections in the laser, increasing the reflectivity of the film system by 0.1% will increase the output power by 10%. The increase in reflectivity not only enhances the output power, but also re...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/08C23C14/16C23C14/08C23C14/10C23C14/35
Inventor 李仁强侯明王云飞孔一君张文琼贺子芙马俊杰孟祥伟岳金明
Owner HENAN MECHANICAL & ELECTRICAL VOCATIONAL COLLEGE
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