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Method for manufacturing X-ray absorption grating and X-ray absorption grating

An absorption grating and manufacturing method technology, which is applied in the direction of using diaphragm/collimator, etc., can solve the problems of limited manufacturing area and high technical barriers, and achieve the effects of simple manufacturing method, low cost, easy operation and realization.

Active Publication Date: 2019-05-24
SHENZHEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, its technical barriers are high and cannot be realized in ordinary laboratories
Subsequently, technologies that applied micro-casting technology, nanoimprinting technology, etc. to the production of gratings appeared, but micro-casting technology needs to go through a high-temperature process in the process of modifying the surface of the micro-structure of the grating, and in the process of metal filling, A special filling furnace is required, and there is a certain breakage rate
Although nanoimprint technology can obtain small-period analysis gratings, the fabrication area is very limited.

Method used

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  • Method for manufacturing X-ray absorption grating and X-ray absorption grating
  • Method for manufacturing X-ray absorption grating and X-ray absorption grating
  • Method for manufacturing X-ray absorption grating and X-ray absorption grating

Examples

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Effect test

Embodiment 1

[0041] Embodiment 1. A method for manufacturing an X-ray absorption grating, comprising the following steps:

[0042] A. Fabrication of grating microstructure: making grating grooves or grating holes on the substrate according to the grating pattern;

[0043]The grating pattern is copied to the surface of the substrate covered with photoresist by using a mask plate, and the grating pattern is solidified on the surface of the substrate by developing and fixing. The duplication and curing of the raster graphics can be carried out by using existing conventional technologies, which will not be repeated here. The grating graphics can be designed according to actual needs. It can be a one-dimensional structure or a two-dimensional structure. The one-dimensional structure can use strips. It can also be a combination of strips and four-sided enclosed structural units. The quadrilateral enclosing structure units can be curved structures connected end to end, such as circles, ellipses...

Embodiment 1-1

[0058] Embodiment 1-1, a method for manufacturing an X-ray absorption grating, comprising the following steps:

[0059] A. Grating microstructure: choose a 5-inch silicon substrate, first copy the grating pattern on the mask to the silicon substrate covered with photoresist, the grating pattern is a strip array, the period is 42 microns, and the duty cycle is 1 / 4, curing the grating pattern on the silicon substrate by developing and fixing. The substrate of this embodiment is a silicon substrate, which can also be directly replaced with a germanium substrate, a diamond substrate or a plastic substrate, without affecting the experimental results.

[0060] Using DRIE (Deep Reactive Ion Etching) technology to etch inward on the surface of the silicon substrate, a grating groove structure with a depth of 150 μm was fabricated, with an aspect ratio of 3.57.

[0061] B. Cleaning and drying: Use acetone to clean the silicon substrate under ultrasound for 15 minutes, then use pure w...

Embodiment 1-2

[0070] Embodiment 1-2, a method for manufacturing an X-ray absorption grating, comprising the following steps:

[0071] A. Fabrication of grating microstructure: the substrate is a silicon substrate with an N-type 5-inch crystal orientation (100), and one side of the silicon substrate is covered with a layer of 300nm thick Si 3 N 4 Thin film, and then use photolithography technology to copy the grating pattern (strip array) on the mask plate to the silicon substrate covered with photoresist, and cure the grating pattern on the silicon substrate by developing and fixing. 3 N 4 On the thin film, etch away the exposed Si 3 N 4 film. The grating pattern here is a stripe array with a period of 5.6 microns and a duty cycle of 1 / 2. The other side of the silicon substrate is also made of a layer of grid-shaped electrodes by photolithography technology, and the surface is protected and placed in the prepared 20% KOH solution. After the inverted pyramid-shaped tip structure is etch...

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Abstract

The invention discloses a method for preparing an X-ray absorption grating and an X-ray absorption grating. The manufacturing method comprises the following steps of: manufacturing grating grooves orgrating holes on a substrate to form a grating groove array or a grating hole array; washing the substrate with an organic solvent, water and a surfactant; adding a volatile solvent and a surfactant into the metal nanoparticles to prepare a suspension; under vacuum, filling the metal nanoparticle suspension into a grating microstructure, and settling the metal nanoparticles to fill the grating groove or the grating hole; detecting, if the filling is not uniform or metal nanoparticles are not distributed in the grating microstructure, continuing filling; cleaning the metal nanoparticles on thesurface of the substrate. The absorption grating comprises a substrate, wherein the grating groove array or the grating hole array is arranged on the substrate, and the grating grooves or the gratingholes are filled with metal nanoparticles. The performance of the absorption grating is very different from that of a grating made of a molten metal material, the manufacturing method is simple, the threshold is low, the cost is low, and the method is convenient to operate and achieve in a common laboratory.

Description

technical field [0001] The invention relates to an X-ray absorption grating, in particular to a manufacturing method of the X-ray absorption grating. Background technique [0002] Absorption grating is an indispensable key device in X-ray grating differential phase contrast imaging technology. In this technology, it can be divided into source grating and analysis grating. In 2006, F.Pfeiffer et al. introduced the Lau effect into X-ray phase contrast imaging technology, using source gratings to modulate the incoherent X-rays emitted by ordinary X-ray tubes into partial coherence (within one grating period). While requiring coherence, the X-ray flux is fully utilized. On the other hand, in order to distinguish the shear amount of the phase grating self-imaging fringes caused by the object, an analysis grating is usually placed at the self-imaging position to sample the phase information. [0003] Generally, the period of the analysis grating is small and the aspect ratio is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/02
Inventor 李冀雷耀虎黄建衡刘鑫
Owner SHENZHEN UNIV