Single-size strong current cluster pulse beam generating method
A generation method and technology of clusters, which are applied in the direction of nuclear reaction targets, DC voltage accelerators, ion implantation plating, etc., can solve the problems that are difficult to meet the precise measurement and application research of cluster properties, and the cluster beam intensity is weak. , to achieve the effect of meeting the application requirements and strong instantaneous beam intensity
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[0025] Example 1
[0026] Such as figure 1 As shown, the method for generating a single-size high-current cluster pulse beam includes the following steps:
[0027] Step 1: Prepare single size cluster target
[0028] A continuous cluster beam 1 is generated from a conventional cluster source, and clusters of a single size are selected by the cluster quality selector 2 and deposited on the low-temperature base 3, and at the same time, xenon is sprayed on the surface of the low-temperature base 3 through a xenon nozzle 6 to form Solid xenon 4 film; the low-temperature base 3 rotates around an axis perpendicular to the direction of cluster deposition, and scans along the axis to make the clusters cover the entire surface of the cluster to obtain clusters of single size clusters 5 embedded in solid xenon 4 Target 11
[0029] Step 2: Launch a single-size high-current cluster pulse beam
[0030] The cluster target 11 is irradiated with the pulse laser 10 to rapidly vaporize the solid xenon 4...
Example Embodiment
[0046] Example 2
[0047] according to figure 1 The single-size high-current cluster pulse beam generation method shown, the establishment of a single-size high-current cluster pulse beam system is as follows figure 2 As shown, the operation process includes the following steps:
[0048] Step 1: Prepare single size cluster target
[0049] A continuous cluster beam 1 is generated from a conventional cluster source, and clusters of a single size are selected by the cluster quality selector 2 and deposited on the low-temperature base 3, and at the same time, xenon is sprayed on the surface of the low-temperature base 3 through a xenon nozzle 6 to form Solid xenon 4 film; the low-temperature base 3 rotates around an axis perpendicular to the direction of cluster deposition, and scans along the axis to make the clusters cover the entire surface of the cluster to obtain clusters of single size clusters 5 embedded in solid xenon 4 Target 11
[0050] Step 2: Launch a single-size high-curre...
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