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Single-size strong current cluster pulse beam generating method

A generation method and technology of clusters, which are applied in the direction of nuclear reaction targets, DC voltage accelerators, ion implantation plating, etc., can solve the problems that are difficult to meet the precise measurement and application research of cluster properties, and the cluster beam intensity is weak. , to achieve the effect of meeting the application requirements and strong instantaneous beam intensity

Active Publication Date: 2019-06-07
NANJING UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In particular, the clusters produced by the cluster source have a wide size distribution, and in actual use, it is often necessary to obtain a single-sized cluster, so it is necessary to select from the cluster beam through the mass selection system, and the high-precision mass selection As a result, the intensity of a single-sized cluster beam is extremely weak, which is difficult to meet the needs of precise measurement and application research of cluster properties

Method used

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  • Single-size strong current cluster pulse beam generating method
  • Single-size strong current cluster pulse beam generating method

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Experimental program
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Effect test

Embodiment 1

[0026] Such as figure 1 As shown, the pulsed beam generation method of a single-sized intense current cluster includes the following steps:

[0027] Step 1. Preparation of a single-size cluster target

[0028] A continuous cluster beam 1 is generated by a conventional cluster source, and clusters of a single size are selected by a cluster mass selector 2, deposited on a low-temperature base 3, and xenon gas is sprayed on the surface of the low-temperature base 3 through a xenon nozzle 6 to form Solid-state xenon 4 film; the low-temperature base 3 rotates around an axis perpendicular to the cluster deposition direction, and translates and scans along the axis so that the clusters cover the entire surface, and a single-sized cluster 5 is embedded in the solid-state xenon 4 cluster Target 11;

[0029] Step 2. Launch a single-sized high-current cluster pulse beam

[0030] The cluster target 11 is irradiated with a pulsed laser 10 to rapidly vaporize the solid xenon 4 to form a ...

Embodiment 2

[0047] according to figure 1 The shown single-size high-current cluster pulse beam generation method, a set of system for generating single-size high-current cluster pulse beam is as follows figure 2 As shown, its operation process includes the following steps:

[0048] Step 1. Preparation of a single-size cluster target

[0049] A continuous cluster beam 1 is generated by a conventional cluster source, and clusters of a single size are selected by a cluster mass selector 2, deposited on a low-temperature base 3, and xenon gas is sprayed on the surface of the low-temperature base 3 through a xenon nozzle 6 to form Solid-state xenon 4 film; the low-temperature base 3 rotates around an axis perpendicular to the cluster deposition direction, and translates and scans along the axis so that the clusters cover the entire surface, and a single-sized cluster 5 is embedded in the solid-state xenon 4 cluster Target 11;

[0050] Step 2. Launch a single-sized high-current cluster puls...

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Abstract

The invention discloses a single-size strong current cluster pulse beam generating method. The method selects clusters with single sizes to deposit on the surface of a pedestal, the pedestal maintainsa low temperature and is injected with xenon, so that a cluster target that a cluster is embedded into a solid xenon film can be formed; and the cluster target can be irradiated by a pulse laser, anda single-size strong current cluster pulse beam can be released. The method can realize extremely strong beam intensity under the circumstance of guaranteeing highly uniform sizes of the clusters inthe beam; the cluster beam generated by the method cannot be affected by cluster precursor material properties, is a simple, universal and highly stable pulse cluster beam, and can be applied to substances which are solids under normal temperature; and the formation of the pulse cluster beam does not include the process of cluster nucleation growth, so that larger degree of freedom can be realizedon the selection of cluster source sizes, pulse frequencies and pulse widths, and more application demands can be met.

Description

technical field [0001] The invention belongs to the technical fields of basic research of atomic and molecular physics and cluster physics, material surface processing and analysis, and relates to a high-intensity single-size atomic cluster pulse beam generation technology, specifically a single-size high-current cluster pulse beam generation method. Background technique [0002] Cluster beam is a new member of particle beam (electron beam, ion beam, atomic and molecular beam, etc.), which has been developed since the 1970s. Particle beams are widely used in many modern disciplines such as nuclear physics, particle physics, atomic and molecular physics, and plasma physics. The so-called clusters are relatively stable microcosmic aggregates composed of several to thousands of atoms. Compared with traditional ion beams and atomic / molecular beams, cluster beams have remarkable characteristics. The properties of clusters are not only related to the atoms that make up the clust...

Claims

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Application Information

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IPC IPC(8): H05H3/02H05H6/00C23C14/28
Inventor 韩民刘飞邵伟
Owner NANJING UNIV
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