Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for generating pulsed beams of single-sized high-current clusters

A generation method and technology of clusters, applied in the direction of nuclear reaction targets, DC voltage accelerators, microwave masers, etc., can solve the problems that are difficult to meet the precise measurement and application research of cluster properties, and the cluster beam intensity is weak , to achieve the effect of meeting the application requirements and strong instantaneous beam intensity

Active Publication Date: 2020-07-10
NANJING UNIV
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In particular, the clusters produced by the cluster source have a wide size distribution, and in actual use, it is often necessary to obtain a single-sized cluster, so it is necessary to select from the cluster beam through the mass selection system, and the high-precision mass selection As a result, the intensity of a single-sized cluster beam is extremely weak, which is difficult to meet the needs of precise measurement and application research of cluster properties

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for generating pulsed beams of single-sized high-current clusters
  • A method for generating pulsed beams of single-sized high-current clusters

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] like figure 1 As shown, the method for generating a single-size high-current cluster pulsed beam includes the following steps:

[0027] Step 1. Preparation of single-size cluster targets

[0028] A continuous cluster beam 1 is generated by a conventional cluster source, a single-sized cluster is selected by the cluster mass selector 2, and deposited on the low-temperature susceptor 3. At the same time, xenon gas is sprayed on the surface of the low-temperature susceptor 3 through a xenon gas nozzle 6 to form a cluster. Solid-state xenon 4 film; cryogenic base 3 rotates around an axis perpendicular to the cluster deposition direction, and scans in translation along the axis so that the clusters cover its entire surface to obtain single-size clusters 5 embedded in solid xenon 4 clusters target 11;

[0029] Step 2. Launch a single-sized high-current cluster pulse beam

[0030] The cluster target 11 is irradiated with a pulsed laser 10 to rapidly vaporize the solid xenon...

Embodiment 2

[0047] according to figure 1 The shown method for generating a single-sized high-current cluster pulsed beam, a set of systems for generating a single-sized high-current cluster pulsed beam is established as follows: figure 2 As shown, its operation process includes the following steps:

[0048] Step 1. Preparation of single-size cluster targets

[0049] A continuous cluster beam 1 is generated by a conventional cluster source, a single-sized cluster is selected by the cluster mass selector 2, and deposited on the low-temperature susceptor 3. At the same time, xenon gas is sprayed on the surface of the low-temperature susceptor 3 through a xenon gas nozzle 6 to form a cluster. Solid-state xenon 4 film; cryogenic base 3 rotates around an axis perpendicular to the cluster deposition direction, and scans in translation along the axis so that the clusters cover its entire surface to obtain single-size clusters 5 embedded in solid xenon 4 clusters target 11;

[0050] Step 2. La...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
pore sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a single-size strong current cluster pulse beam generating method. The method selects clusters with single sizes to deposit on the surface of a pedestal, the pedestal maintainsa low temperature and is injected with xenon, so that a cluster target that a cluster is embedded into a solid xenon film can be formed; and the cluster target can be irradiated by a pulse laser, anda single-size strong current cluster pulse beam can be released. The method can realize extremely strong beam intensity under the circumstance of guaranteeing highly uniform sizes of the clusters inthe beam; the cluster beam generated by the method cannot be affected by cluster precursor material properties, is a simple, universal and highly stable pulse cluster beam, and can be applied to substances which are solids under normal temperature; and the formation of the pulse cluster beam does not include the process of cluster nucleation growth, so that larger degree of freedom can be realizedon the selection of cluster source sizes, pulse frequencies and pulse widths, and more application demands can be met.

Description

technical field [0001] The invention belongs to the technical fields of basic research of atomic and molecular physics and cluster physics, as well as material surface processing and analysis, and relates to a high-intensity, single-size atomic cluster pulsed beam generation technology, in particular a single-size strong-current cluster pulsed beam generation method. Background technique [0002] Cluster beam is a new member of particle beam (electron beam, ion beam, atomic and molecular beam, etc.), which has been developed since the 1970s. Particle beams are widely used in nuclear physics, particle physics, atomic and molecular physics, plasma physics and many other modern disciplines, and have also become an indispensable processing method in industrial fields such as microelectronics, optoelectronics, metallurgy, aviation and aerospace. The so-called cluster is a relatively stable microscopic aggregate composed of several to thousands of atoms. Compared with traditional...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H05H3/02H05H6/00C23C14/28
Inventor 韩民刘飞邵伟
Owner NANJING UNIV
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com