Graphene-assisted GaN rectifier and preparation method thereof
A technology of graphene and rectifiers, which is applied in the field of graphene-assisted GaN rectifiers and its preparation, can solve problems such as failure of high-frequency working devices, achieve the effects of solving desorption, suppressing device breakdown problems, and improving yield
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[0038] The preparation method of the graphene-assisted GaN rectifier of the present embodiment comprises the following steps:
[0039](1) Surface cleaning of the epitaxial wafer: place the AlGaN / GaN epitaxial wafer in acetone, isopropanol, absolute ethanol, and deionized water for 5 minutes, and then take it out and dry it with high-purity nitrogen;
[0040] (2) Alignment mark etching on the surface of the epitaxial wafer: Spin-coat a photoresist with a thickness of 2um on the surface of the epitaxial wafer, and then expose the alignment mark on the photolithographic mask on the epitaxial wafer by means of photolithography and development, Then put the photolithographically completed epitaxial wafer in the ICP equipment, etch for 45s, and re-etch the alignment mark on the epitaxial wafer by etching, and then put the epitaxial wafer in the degumming solution and ultrasonically clean it for 5 minutes to remove the excess surface of the epitaxial wafer. Photoresist.
[0041] (3)...
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