Inorganic-organic/inorganic hybrid dual-layer nano-film memristor for simulating nerve synapses, and preparation method of memristor

A technology of neural synapses and nano-thin films, applied in semiconductor/solid-state device manufacturing, nanotechnology for information processing, nanotechnology, etc., to achieve the effect of easy design and processing

Active Publication Date: 2019-06-18
NANJING UNIV
View PDF5 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In previous studies, most of the memristive functional layers were made of inorganic materials, and a small amount of organic memristive materials were involved. For inorganic-organic hybrid materials, their application in new neuromorphic devices can make use of the excellent photoelectric properties of inorganic materials. characteristics, and can combine the diversity of organic species (functional groups) and easy processing characteristics to take advantage of the hybridization of the two, open up new ideas for the selection of memristor materials, and provide a broader prospect for the application of memristors, but The report of inorganic-organic hybrid material system in memristor is still very rare, especially for the realization of synapse-like bionic function, which has not been reported so far.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Inorganic-organic/inorganic hybrid dual-layer nano-film memristor for simulating nerve synapses, and preparation method of memristor
  • Inorganic-organic/inorganic hybrid dual-layer nano-film memristor for simulating nerve synapses, and preparation method of memristor
  • Inorganic-organic/inorganic hybrid dual-layer nano-film memristor for simulating nerve synapses, and preparation method of memristor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] An inorganic-organic / inorganic hybrid double-layer nano-film memristor simulating neural synapses, comprising a substrate, a bottom electrode, a memristive functional layer, and a top electrode from bottom to top; the memristive functional layer consists of The lower inorganic-organic hybrid thin film and the upper metal oxide thin film are composed of a double-layer nano-stack structure thin film material.

[0026] This embodiment is an inorganic-organic / inorganic hybrid double-layer nano-film memristor-Pt / TiO 2 / Ti-based maleic acid / TaN / SiO 2 / Si memristor fabrication process. The tantalum nitride prepared by magnetron sputtering was used as the bottom electrode, the binary unsaturated carboxylic acid-maleic acid was used as the organic precursor, and titanium tetrachloride was used as the inorganic precursor, and the titanium base was prepared by molecular layer deposition (MLD). Maleic acid inorganic-organic hybrid nano film; using titanium tetrachloride (TiCl 4 ...

Embodiment 2

[0037] An inorganic-organic / inorganic hybrid double-layer nano-film memristor simulating neural synapses, comprising a substrate, a bottom electrode, a memristive functional layer, and a top electrode from bottom to top; the memristive functional layer consists of The lower inorganic-organic hybrid thin film and the upper metal oxide thin film are composed of a double-layer nano-stack structure thin film material.

[0038] This embodiment is an inorganic-organic / inorganic hybrid double-layer nano-film memristor-Pt / ZnO / Zn-based succinic acid / TiN / SrTiO 3 Fabrication process of memristors. Titanium nitride prepared by plasma-enhanced ALD (PEALD) process is used as the bottom electrode, dibasic saturated carboxylic acid-succinic acid is used as the organic precursor, diethyl zinc is used as the inorganic precursor, and molecular layer deposition (MLD) is used. Zinc-based succinic acid inorganic-organic hybrid nanofilm; using diethylzinc and deionized water (H 2 O) as precursor, ...

Embodiment 3

[0043] An inorganic-organic / inorganic hybrid double-layer nano-film memristor simulating neural synapses, comprising a substrate, a bottom electrode, a memristive functional layer, and a top electrode from bottom to top; the memristive functional layer consists of The lower inorganic-organic hybrid thin film and the upper metal oxide thin film are composed of a double-layer nano-stack structure thin film material.

[0044] This embodiment is an inorganic-organic / inorganic hybrid double-layer nano-film memristor-Au / Al 2 o 3 / Ti-based glutaconic acid / TiN / PI memristor preparation process. Titanium nitride prepared by magnetron sputtering was used as the bottom electrode, binary unsaturated carboxylic acid-glutaconic acid was used as the organic precursor, titanium tetrachloride was used as the inorganic precursor, and molecular layer deposition (MLD) was used to prepare titanium Based glutaconic acid inorganic-organic hybrid nano film; using trimethylaluminum (Al(CH 3 ) 3 ) a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an inorganic-organic/inorganic hybrid dual-layer nano-film memristor for simulating nerve synapses, and belongs to the cross field of semiconductor microelectronic devices andartificial intelligence. A molecular layer deposition technology and an atomic layer deposition technology are utilized to prepare the inorganic-organic/inorganic hybrid dual-layer nano-film memristorwith a good nerve synapse simulation bionic function; and the adopted molecular layer deposition and atomic layer deposition technologies can be compatible with a microelectronic process and are suitable for large-scale integration. The memristor comprises a substrate, a bottom electrode, a memristor functional layer and a top electrode in sequence from bottom to top, wherein the memristor functional layer consists of two layers of nano-stack structure film materials including a lower-layer inorganic-organic hybrid film and an upper-layer metal oxide film.

Description

technical field [0001] The invention belongs to the intersection field of semiconductor microelectronic devices and artificial intelligence, and in particular relates to an inorganic-organic / inorganic hybrid double-layer nanometer film memristor simulating neural synapses and a preparation method thereof. Background technique [0002] Memristor is the fourth passive circuit device after resistors, capacitors, and inductors. In 1971, when Chinese scientist Professor Cai Shaotang studied the relationship between voltage, current, charge, and magnetic flux, according to the integrity of the mathematical logic relationship propose. The resistance of a memristor can change with voltage, and it can remember the changed state, that is, the resistance value at a certain moment is related to the current flowing through the device. This feature is very similar to the working principle of synapses in organisms. The connection strength between synapses changes with the stimulation of e...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/05H01L51/40B82Y10/00
Inventor 李爱东刘畅曹燕强吴迪
Owner NANJING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products