Modified hollow microsphere as well as preparation method and application thereof
A hollow and microsphere technology, used in adhesive additives, non-polymer adhesive additives, polymer adhesive additives, etc., can solve the problem of unsatisfactory performance stability and life of electronic components, adsorption and capture of hollow microspheres Insufficient capacity, unsatisfactory thermal conductivity and heat dissipation performance, etc., to achieve the effect of increasing the degree of dipolarization and adsorption capacity, increasing thermal conductivity, and improving thermal conductivity
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[0036] Based on the modified hollow microspheres described in the embodiments of the invention above, the present invention also provides a preparation method of the modified hollow microspheres. The preparation method of the modified hollow microspheres comprises the following steps:
[0037] Carry out surface grafting treatment to the hollow microsphere matrix, so that the organic compound is grafted onto the surface of the hollow microsphere to form a hollow microsphere with an organic compound bound to the surface. The general structural formula of the organic compound is A1-D-A2, and the A1 and A2 are electron-withdrawing groups, and D is an organic group with symmetrical molecular structure.
[0038] In one embodiment, the hollow microsphere matrix is subjected to surface grafting treatment, and the step of grafting the organic compound to the surface of the hollow microsphere comprises:
[0039] Preparation of organic solutions containing isocyanate groups;
[0040]...
Embodiment 11
[0067] This embodiment provides a modified hollow microsphere and its preparation method. The modified hollow microspheres include a polyurethane hollow microsphere matrix and the above-mentioned L1 compound combined on the polyurethane hollow microsphere matrix.
[0068] The modified hollow microspheres described in Example 11 were prepared according to the following method:
[0069] (1) Preparation of polyurethane hollow microsphere matrix: adopt Pickering suspension polymerization method to prepare thermal hollow microsphere, weigh 0.5g nanometer Mg(OH) 2 , 0.25g NaCl, 0.01g NaNO 2 Dissolve in 50mL deionized water, stir for 15 minutes and mix evenly as the aqueous phase of suspension polymerization; weigh 14g acrylonitrile, 4g methyl methacrylate, 2g butyl acrylate, 0.08g trimethylolpropane trimethacrylate, 0.4g of azobisisobutyronitrile and 7g of isooctane were stirred at room temperature for 30 minutes and mixed uniformly as the oil phase; after mixing the water phase a...
Embodiment 12
[0072] This embodiment provides a modified hollow microsphere and its preparation method. The modified hollow microspheres include a polyurethane hollow microsphere matrix and the above-mentioned L3 compound combined on the polyurethane hollow microsphere matrix.
[0073] The modified hollow microspheres described in Example 12 were prepared according to the following method:
[0074] (1) Preparation of polyurethane hollow microsphere matrix: prepare with reference to the step (1) of Example 11;
[0075] (2) Modification of the polyurethane hollow microsphere matrix: Prepared with reference to step (2) of Example 11, the difference is that the polyurethane hollow microsphere matrix is modified by using L3; wherein, the L3 compound is effective on the polyurethane hollow microsphere matrix The modified method is as shown in Example 11.
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