Wastewater treatment device for nanochip production line

Abstract

The invention provides a wastewater treatment device for a nanochip production line. A stirring device is arranged in a pretreatment tower to improve the treatment effect, and a transmission shaft isused to reciprocate up and down, and turning blades continuously stir a liquid at the lower part of a pre-regulation tower to enable the liquid at the lower part to enter a stirring zone of stirring blades, so that it is guaranteed that there is no dead angle in the stirring. A rotating shaft is rotated by a driving shaft to stir the liquid in the pre-regulation tower to ensure sufficient reactionand improve the reaction efficiency. The one-to-one correspondence relation between multiple annular spray pipes and filler boxes ensures that a filler is fully subjected to gas-liquid exchange, andthe blowing efficiency is improved. By arranging vibrating members at the bottom of a main blowing tower and a secondary blowing tower, vibration barrels are used to impact the filler member, so thatthe filler member vibrates. With utilization of the integrated structure of the filler membrane and the vibration transmission property, the whole filler member vibrates together, thus the blockage ofthe filler is avoided, the fluidity of a liquid in the main blowing tower and the secondary blowing tower and the permeability of a gas flow are ensured, and further the ammonia nitrogen stripping rate is improved.

Description

technical field [0001] The invention relates to the technical field of wastewater treatment, in particular to a wastewater treatment device used in a nanochip production line. Background technique [0002] Nanomaterials are now widely used in the field of chips. Chips are also called semiconductor components. Its essence is a kind of silicon chip, which is an important carrier of integrated circuits and can play an important role in the field of electronic information technology. Chips with smaller nanometers Means better performance. During the manufacturing process of nanochips, a series of photolithography, deposition, cleaning and other processes are performed, and then packaging and electrical testing are carried out, and finally the final product is formed. At present, in the manufacturing process of nanochips, a large amount of industrial wastewater will be generated, including ammonia-containing wastewater, fluorine-containing wastewater, CMP wastewater, acid-base w...

AI Technical Summary

Problems solved by technology

At present, in the manufacturing process of nanochips, a large amount of industrial wastewater will be generated, including ammonia-containing wastewater, fluorine-containing wastewater, CMP wastewater, acid-base wastewater, organic wastewater, and waste gas scrubber wastewater. The ammonia-containing wastewater includes concentrated ammonia wastewater and dilute ammonia wastewater. The main pollutant index in the concentrated ammonia wastewater is ammonia nitrogen. However, the existing concentrated ammonia wastewater treatment devices generally have stripping tower packing that is easy to block and remove. The disadvantage of low efficiency

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