Lubricating film and its preparation method and application
A lubricating film and metal substrate technology, applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve problems such as limited application and low bonding strength
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Embodiment 1
[0041] Stainless steel substrate surface treatment
[0042] S1. Place a stainless steel substrate having a thickness of 2 mm in a magnetron sputtering gas phase deposition vacuum system, argon plasma sputter cleaning, argon gas flow rate of 100 Sccm, substrate bias is -1000 V, treatment time is 30 min;
[0043] S2. The magnetron sputter deposition thickness is 0.2 μm Ti adhesive layer: the metal Ti target is a cathode, the working gas is argon, the power supply is 200W, the bias voltage is 30 min;
[0044] S3. Magnetron sputter deposition thickness is a surface layer of 0.5 μm metal nanocrystallization in amorphous matrix diamond carbon: During deposition, the vacuum of the vacuum chamber is 2 × 10 -3 PA, the discharge pressure is 3 Pa. AR gas and methane mixed atmosphere, the AR gas flow was 50 sccm, and the methane flow was 12 to 18 sccm. High pure metal Cu target and high pure MOS 2 Composite target is a cathode, MOS 2 The power of the target is 160W, the power of the Cu target...
Embodiment 2
[0046] Unlike Example 1, the surface layer of the magnetron sputter deposition thickness is 0.5 μm metal nanocrystallization in the amorphous matrix diamond carbon. The metal substrate used is a Cu-Ni-P-based low alloy steel substrate.
Embodiment 3
[0048] Unlike Example 1, the surface layer of the magnetron sputter deposited thickness of 3.5 μm in the metallic nanocrystallization in the amorphous matrix diamond carbon. The metal substrate used is a Cu-Cr-P-based low alloy steel substrate.
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