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Manufacturing process of diffractive optical element

A diffractive optical element and manufacturing process technology, applied in the field of optical elements, can solve problems such as low etching efficiency and inability to connect smoothly, and achieve the effect of improving etching efficiency

Inactive Publication Date: 2019-09-17
宁波亿流信息科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the above problems in the prior art, provide a diffractive optical element manufacturing process, solve the existing method and process for manufacturing diffractive optical elements, and the etching work of closely arranged diffractive grooves has the problem of etching Inefficiency, the problem that the angle between the side of the diffraction groove and the ground cannot be smoothly connected

Method used

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  • Manufacturing process of diffractive optical element
  • Manufacturing process of diffractive optical element
  • Manufacturing process of diffractive optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Such as figure 1 , figure 2 The first embodiment shown is a manufacturing process of a diffractive optical element, which includes the following steps:

[0029] Step 1: Use a glass cutting machine to cut the glass plate into glass pieces;

[0030] Step 2: Grinding the glass sheet with a double-sided grinding and polishing machine to make the glass sheet form an ultra-smooth surface;

[0031] Step 3: Use an ultrasonic cleaning machine to clean the glass sheet formed with an ultra-smooth surface, remove the dust bonded to the glass surface, and dry the surface of the glass sheet;

[0032] Step 4: put the glass sheet after surface cleaning and drying into a vacuum coating machine to form a metal film on the surface of the glass sheet by evaporation, the material of the metal film is gold, and the thickness is 100nm;

[0033] Step 5: Spin-coat photoresist on the metal film with a glue equalizer to form a photoresist layer A, and use electron beam lithography to etch on ...

Embodiment 2

[0041] Such as figure 1 , image 3 The second embodiment shown is a manufacturing process of a diffractive optical element, including the following steps:

[0042] Step 1: Use a glass cutting machine to cut the glass plate into glass pieces;

[0043] Step 2: Grinding the glass sheet with a double-sided grinding and polishing machine to make the glass sheet form an ultra-smooth surface;

[0044] Step 3: Use an ultrasonic cleaning machine to clean the glass sheet formed with an ultra-smooth surface, remove the dust bonded to the glass surface, and dry the surface of the glass sheet;

[0045] Step 4: put the glass sheet after surface cleaning and drying into a vacuum coating machine to form a metal film on the surface of the glass sheet by evaporation, the material of the metal film is gold, and the thickness is 50nm;

[0046] Step 5: Spin-coat photoresist on the metal film with a glue equalizer to form a photoresist layer A, and use electron beam lithography to etch on the me...

Embodiment 3

[0054] Such as figure 1 The third embodiment shown is a manufacturing process of a diffractive optical element, including the following steps:

[0055] Step 1: Use a glass cutting machine to cut the glass plate into glass pieces;

[0056] Step 2: Grinding the glass sheet with a double-sided grinding and polishing machine to make the glass sheet form an ultra-smooth surface;

[0057] Step 3: Use an ultrasonic cleaning machine to clean the glass sheet formed with an ultra-smooth surface, remove the dust bonded to the glass surface, and dry the surface of the glass sheet;

[0058] Step 4: put the glass sheet after surface cleaning and drying into a vacuum coating machine to form a metal film on the surface of the glass sheet by evaporation, the material of the metal film is gold, and the thickness is 80nm;

[0059] Step 5: Spin-coat photoresist on the metal film with a glue equalizer to form a photoresist layer A, and use electron beam lithography to etch on the metal film to for...

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Abstract

The invention relates to a manufacturing process of a diffractive optical element, and belongs to the technical field of optical components. The manufacturing process comprises the following steps of manufacturing an imprint template by cutting, grinding, cleaning, drying, coating, gluing, photolithography, plasma etching and electroforming, spin-coating photoresist on the surface of the substrate to form a photoresist layer B, pressing the imprint template on the surface of the photoresist layer B, forming an embossed groove on the photoresist layer B by pressurization, curing the photoresist by ultraviolet light, removing the template, removing the photoresist at the bottom of the embossed groove to expose the surface of the substrate, etching to form diffraction grooves by an etchant on the surface of the substrate under the embossed groove to remove the entire photoresist on the surface of the substrate, and obtaining a diffractive optical element. The manufacturing process provided by the invention has the beneficial effects of improving the etching efficiency of the closely arranged diffraction grooves, and etching the diffraction grooves formed on the surface of the substrate by using an etchant, so that the sides of the diffraction grooves are in smooth connection with the ground.

Description

technical field [0001] The invention relates to the field of optical elements, in particular to a manufacturing process of a diffractive optical element. Background technique [0002] Diffractive optical element refers to an optical device that changes the diffraction of light without changing the amplitude but periodically changing the phase after the light wave passes through the optical element. At present, there are many methods and processes for making diffractive optical elements. The main method is to make a photoresist pattern on a quartz substrate, use the photoresist as a mask, and then use the plasma dry method to etch the quartz to a certain depth to achieve phase modulation. effect. Although this method is simple, the etching efficiency of the closely arranged diffraction grooves is low, and the angle formed between the sides of the diffraction grooves and the ground cannot be smoothly connected. Contents of the invention [0003] The purpose of the present ...

Claims

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Application Information

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IPC IPC(8): G02B5/18
CPCG02B5/1847G02B5/1857
Inventor 赵元昊周照宇章宇杰黄蓉蓉毛雪波陶郑洲
Owner 宁波亿流信息科技有限公司