Planar optical device capable of generating vertex light fields in double channels of near field and far field simultaneously and design and preparation of planar optical device
A technology of optical devices and vortex light, applied in optical components, optics, instruments, etc., to achieve the effect of broad application prospects
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[0090] The preparation method of the planar optical device for simultaneously generating a vortex light field in the near-field and far-field dual channels based on the Ti / Au metal thin film and the rectangular nanohole array is further given below, and its preparation includes the following steps:
[0091] Step 1. Obtain SiO 2 (Quartz glass) transparent substrate, use an organic solvent and an ultrasonic cleaning machine to clean the substrate, and perform ultrasonic cleaning in the order of acetone (10-15min) → ethanol (10-15min) → deionized water (10-15min), Finally, dry the deionized water remaining on the substrate with a nitrogen gun to obtain clean SiO 2 transparent substrate;
[0092] Step 2, coat the metal film layer on the cleaned transparent substrate, and use the method of electron beam evaporation to coat the SiO obtained in the previous step 2 5nm-10nm Ti and 100nm-120nm Au are sequentially plated on the transparent substrate to obtain a substrate coated with a...
Embodiment 1
[0098] Scanning electron microscope (SEM) images of a planar optical device based on Ti / Au metal thin films and rectangular nanohole arrays for dual-channel generation of vortex light fields in the near-field and far-field simultaneously. Figure 6 As shown, its structure and principle are as Figure 1-3 shown, which includes SiO 2 There are three parts: a transparent substrate 1 , a Ti / Au metal thin film 2 and a rectangular nanohole array (metasurface structure) 3 . Of which SiO 2 The transparent substrate 1 is at the bottom, and the Ti / Au metal film 2 is located on the SiO 2 On the transparent substrate 1, a rectangular nanohole array (metasurface structure) 3 is processed in a Ti / Au metal thin film 2 by focused ion beam etching (FIB). The total thickness of the Ti / Au metal film 2 is 105nm, wherein the thickness of Ti is 5nm, and the thickness of Au is 100nm. 2 on a transparent substrate 1. Such as figure 2 As shown, the rectangular nanohole array pattern is circular,...
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