Unlock instant, AI-driven research and patent intelligence for your innovation.

Preparation method for nanometer film on surface of metal substrate by plasma chemical vapor deposition

A technology of chemical vapor deposition and metal substrates, applied in metal material coating process, gaseous chemical plating, final product manufacturing, etc., can solve problems such as insufficient adhesion, unsatisfactory passivation effect, water pollution, etc., to achieve Improve the binding force and adhesion, short-term high-efficiency coating, and reduce the effect of film damage

Active Publication Date: 2019-10-08
FOSHAN SPRING TECH CO LTD
View PDF10 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are some shortcomings in this method: 1) It is not environmentally friendly: because most of the passivation solution contains inorganic metal ions, especially chromium ions, the post-treatment of the passivation solution will bring subsequent environmental protection problems such as water pollution; 2) The operation time is long : After soaking in the passivation solution, the product needs to be dried and left to stand, and it takes a long time to stand still to form a good passivation film, usually for 1-8 hours; 3) The passivation solution will More or less colored, when the product is soaked in the passivation solution, the color of the passivation solution may be brought to the surface of the product, causing the color difference of the product appearance; 4) Organic passivation solution: organic passivation solution in In terms of environmental protection, although it is not as polluting as the inorganic passivation solution, its passivation effect is not as ideal, and after the product is soaked in the organic passivation solution, it takes a long time to dry. After drying, it is easy to leave marks on the product surface and affect the product. Appearance; 5) The subsequent cost of passivation solution treatment is high: the concentration of passivation solution will change with the increase of the number and frequency of use. At this time, it is necessary to continuously monitor the concentration of passivation solution and replenish new passivation solution to maintain Its concentration level, long-term use, will also increase production time and production costs
[0004] Some existing remedial methods include surface spraying / immersion treatment solution and re-anodizing treatment, all of which are traditional physical and chemical methods, which have problems such as long production process time, high cost, insufficient adhesion, unstable quality, and poor environmental friendliness

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method for nanometer film on surface of metal substrate by plasma chemical vapor deposition
  • Preparation method for nanometer film on surface of metal substrate by plasma chemical vapor deposition
  • Preparation method for nanometer film on surface of metal substrate by plasma chemical vapor deposition

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0047] A method for preparing a plasma chemical vapor deposition nano-film on the surface of a metal substrate, comprising the following steps:

[0048] (1), pre-treatment, using compound organic solution to infiltrate and clean the metal substrate to form an organic protective film on the surface of the metal substrate, the main organic component in the compound organic solution is the same as the coating material in step (3) A series of polymeric organic materials with similar structures;

[0049] (2), plasma gas activation treatment, in the reaction chamber, the plasma activated gas is used to process the cleaned metal substrate;

[0050](3) Coating, the vaporized coating material enters the reaction chamber, and under vacuum, the plasma gas carrier gas collides with the vaporized coating material to deposit and form a nano-film on the surface of the metal substrate;

[0051] (4), purification, breaking the vacuum in the reaction chamber;

[0052] (5), post-processing, ta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a preparation method for a nanometer film on the surface of a metal substrate by plasma chemical vapor deposition. The preparation method includes the following steps of (1) pretreatment; (2) plasma gas activating treatment; (3) film coating; (4) purification; and (5) aftertreatment, wherein in the pretreatment, a compound organic solution is adopted to infiltrate and cleanthe metal substrate to form an organic protective film on the surface of the metal substrate, and the main organic components in the compound organic solution and film coating materials in the thirdstep belong to the same class of polymer organic materials with similar structures; and during purification, vacuum breaking is conducted in the interior of a reaction chamber. The surface of the metal substrate is coated with the nanometer film by the plasma chemical vapor deposition method, compared with existing traditional physical and chemical methods such as passivation solution soaking, treatment solution surface spraying / soaking and re-anodizing treatment, high-efficiency film coating can be achieved in a short time, the performance of the nanometer film is good, centralized treatment of tail gas can be achieved, and environmental friendliness is achieved.

Description

technical field [0001] The invention relates to the technical field of plasma-enhanced chemical vapor deposition coating, in particular to a method for preparing a plasma chemical vapor deposition nano-film on the surface of a metal substrate. Background technique [0002] The surface of metal substrate products is generally treated by anodic oxidation and other processes, and a layer of metal oxide protective film will be formed on the surface. This protective film will protect the metal substrate from external water vapor and other substances to a certain extent. corrosion resistance. However, due to differences in product quality control during the production process, it is easy to cause uneven thickness of the anodized film. At the same time, if laser engraving of the trademark is required, the anodized film layer on the surface of the metal substrate will be loose. Even carving through the anodized film layer causes the metal substrate to be directly exposed to the ext...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/02C23C16/505C23C16/52C23C16/455
CPCC23C16/0272C23C16/505C23C16/52C23C16/455Y02P70/50
Inventor 吕伟桃王宪梁宸
Owner FOSHAN SPRING TECH CO LTD