Preparation method for nanometer film on surface of metal substrate by plasma chemical vapor deposition
A technology of chemical vapor deposition and metal substrates, applied in metal material coating process, gaseous chemical plating, final product manufacturing, etc., can solve problems such as insufficient adhesion, unsatisfactory passivation effect, water pollution, etc., to achieve Improve the binding force and adhesion, short-term high-efficiency coating, and reduce the effect of film damage
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[0047] A method for preparing a plasma chemical vapor deposition nano-film on the surface of a metal substrate, comprising the following steps:
[0048] (1), pre-treatment, using compound organic solution to infiltrate and clean the metal substrate to form an organic protective film on the surface of the metal substrate, the main organic component in the compound organic solution is the same as the coating material in step (3) A series of polymeric organic materials with similar structures;
[0049] (2), plasma gas activation treatment, in the reaction chamber, the plasma activated gas is used to process the cleaned metal substrate;
[0050](3) Coating, the vaporized coating material enters the reaction chamber, and under vacuum, the plasma gas carrier gas collides with the vaporized coating material to deposit and form a nano-film on the surface of the metal substrate;
[0051] (4), purification, breaking the vacuum in the reaction chamber;
[0052] (5), post-processing, ta...
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