Algan/gan heterojunction Schottky diode device based on p-gan cap layer and floating metal ring
A Schottky diode and metal ring technology, applied in diodes, semiconductor/solid-state device manufacturing, semiconductor devices, etc., can solve the problems of forward characteristic influence, increase in series resistance, slow change in lateral potential, etc., to avoid defects, Improved breakdown voltage and reverse leakage current suppression effects
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Embodiment 1
[0036] See figure 1 , figure 1 It is a schematic structural diagram of an AlGaN / GaN heterojunction Schottky diode device based on a P-GaN cap layer and a floating metal ring provided by an embodiment of the present invention. The AlGaN / GaN heterojunction Schottky diode device includes a substrate 101, a GaN buffer layer 102 and a channel layer 103, an AlGaN barrier layer 104, and a passivation layer 110 sequentially disposed on the substrate 101, wherein the AlGaN An anode 105 and a cathode 106 are respectively provided on opposite sides of the upper surface of the barrier layer 104, and at least one combined structure is provided on the AlGaN barrier layer 104 between the anode 105 and the cathode 106, and the combined structure includes a first P-type GaN The cap layer 107, the second P-type GaN cap layer 108 and the floating metal ring 109; the first P-type GaN cap layer 107 and the second P-type GaN cap layer 108 are arranged on the AlGaN barrier layer 104 at intervals, and ...
Embodiment 2
[0051] On the basis of the foregoing embodiment, this embodiment provides another AlGaN / GaN heterojunction Schottky diode device based on a P-GaN cap layer and a floating metal ring.
[0052] As described above, the AlGaN barrier layer 104 between the anode 105 and the cathode 106 is provided with at least one of the combined structures, that is, the AlGaN barrier layer 104 between the anode 105 and the cathode 106 can be provided with multiple structures. The combined structure. The main difference between this embodiment and the first embodiment is that this embodiment may include a plurality of the combined structures, wherein, along the direction from the anode 105 to the cathode 106, the first P-type GaN cap layer 107 of the first combined structure is located The side close to the anode 105 and spaced apart from the anode 105; the second P-type GaN cap layer 108 of the last combined structure is located on the side close to the cathode 106 and spaced apart from the cathode ...
Embodiment 3
[0060] On the basis of the foregoing embodiment, this embodiment provides a method for preparing an AlGaN / GaN heterojunction Schottky diode device based on a P-GaN cap layer and a floating metal ring. See Figure 7a to Figure 7f , Figure 7a to Figure 7f It is a schematic diagram of the manufacturing process of an AlGaN / GaN heterojunction Schottky diode device based on a P-GaN cap layer and a floating metal ring provided by an embodiment of the present invention.
[0061] The preparation method includes:
[0062] Step 1: Use the MOCVD (metal organic vapor deposition) process to epitaxially grow the heterojunction.
[0063] 1.1) Choose SiC or sapphire substrate, such as Figure 7a Shown
[0064] 1.2) On the SiC or sapphire substrate, an intrinsic GaN layer with a thickness of 1 μm is grown;
[0065] 1.3) A 25nm thick AlGaN barrier layer is grown on the intrinsic GaN layer, in which the Al composition is 20%, and a two-dimensional electron gas is formed at the contact position of the int...
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