A kind of trenching preparation method of thick film silicon nitride waveguide
A technology of silicon nitride and waveguide, which is applied in the field of integrated optics, can solve the problems of not steep enough sidewall, large waveguide loss, rough sidewall, etc., to avoid unevenness, reduce waveguide loss, and reduce sidewall roughness Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0026] In this embodiment, a method for preparing grooves of a thick-film silicon nitride waveguide, such as figure 1 shown, including:
[0027] S1. Forming a lower cladding layer on the semiconductor substrate along the thickness direction of the semiconductor substrate;
[0028] On the basis of the above solutions, further, the semiconductor substrate in this implementation manner is a silicon substrate, and in other implementation manners, the semiconductor substrate may also be a quartz substrate.
[0029] On the basis of the above solution, further, the lower cladding layer is formed by thermal oxidation and / or chemical vapor deposition process, and in other embodiments, the lower cladding layer can also be formed by physical vapor deposition process. The lower cladding material includes a solid cladding material with a refractive index lower than 1.7 and higher than 1, preferably silicon dioxide.
[0030] S2. Photolithography and etching the lower cladding layer to for...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
width | aaaaa | aaaaa |
width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com