Van der Waals heterojunction and preparation method thereof, anode material and field effect transistor
A technology of heterojunction and two-dimensional nanomaterials, applied in chemical instruments and methods, electrodes, transistors, etc., can solve the problems of low carrier mobility, large performance difference, air instability, etc., and achieve a broad application prospect Effect
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[0042] Such as figure 1 As shown, the preparation method of the van der Waals heterojunction provided in the embodiment of the present invention includes the following steps:
[0043] S101: On SiO by chemical vapor deposition 2 Prepare high-purity molybdenum disulfide film on the substrate;
[0044] S102: Prepare hafnium disulfide on molybdenum disulfide substrate by molecular epitaxy beam method, and obtain HfS with different thicknesses 2 -MoS 2 Heterojunction.
[0045] The preparation method of the van der Waals heterojunction provided in the embodiment of the present invention specifically includes the following steps:
[0046] (1) Prepare equipment and raw materials: CVD tube furnace, molecular epitaxy growth equipment, SiO 2 As the substrate, Mo thin film, Hf thin film, pure sulfur, high-purity silicon, as the gas source.
[0047] (2) Preparation of molybdenum disulfide film: preheat the CVD reaction furnace after cleaning. After the preparatory work, place the Mo...
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