A UV/IR dual-color detector based on boron nitride

The technology of a two-color detector and an ultraviolet detector, which is applied in the field of ultraviolet/infrared two-color detectors, can solve the problems of difficult to improve, highly toxic raw materials, unsuitable for large-scale application, etc., and achieves the effect of simple preparation

Active Publication Date: 2021-01-26
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

However, this in-band transition from the GaN valence band to the AlGaN valence band can only be realized at low temperatures, so the GaN / AlGaN quantum well system UV / IR dual-color detector has a good UV response, but the infrared response is not good. Not suitable for large-scale application
In order to improve the infrared detection performance of the GaN / AlGaN quantum well system, the researchers introduced a narrow bandgap semiconductor material suitable for infrared detection combined with a wide bandgap semiconductor suitable for ultraviolet detection to achieve effective two-color detection, MCT (mercurycadmium tellurium) / GaN system and PbS / ZnO system have appeared one after another, but these materials still have the disadvantages of infrared response requiring low-temperature cooling, raw materials are highly toxic, etc.
In addition, the researchers combined the ultraviolet detection performance of Pt / CdS and the infrared detection performance of InSb to achieve ultraviolet / infrared dual-color response, but the ultraviolet detection of Pt / CdS is not in the solar blind ultraviolet band, which limits its application.
Harbin University of Science and Technology combined the solar-blind ultraviolet detection performance of AlGaN and the infrared detection performance of graphene to realize the ultraviolet / infrared dual-color detector, but the preparation of graphene in this system needs to go through a relatively complicated transfer process, which inevitably introduces A large amount of contamination, which causes low detector performance and is difficult to improve
[0004] In summary, in the prior art, there has not been a material that can achieve simultaneous detection of ultraviolet and infrared, is not limited by low temperature, is safe and environmentally friendly, and is easy to prepare. Therefore, exploring new materials is still the field of ultraviolet / infrared dual-color detectors. Bottleneck problems faced in development

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  • A UV/IR dual-color detector based on boron nitride
  • A UV/IR dual-color detector based on boron nitride
  • A UV/IR dual-color detector based on boron nitride

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Embodiment 1

[0034] Such as figure 1 As shown, the ultraviolet / infrared dual-color detector based on boron nitride is composed of a substrate 3, an ultraviolet detector epitaxial layer 1 and an infrared detector epitaxial layer 2. The ultraviolet detector epitaxial layer 1 is in the shape of a cube, and the lower surface and the substrate 3 have the same upper surface size, fixed on the upper surface of the substrate 3 (substrate 3 is a sapphire substrate), the material of the ultraviolet detector epitaxial layer 1 is three-dimensional boron nitride, and the thickness of the ultraviolet detector epitaxial layer 1 is 100 Nano. The infrared detector epitaxial layer 2 is also square, and the lower surface is the same size as the upper surface of the ultraviolet detector epitaxial layer 1. The lower surface of the infrared detector epitaxial layer 2 is fixed on the upper surface of the ultraviolet detector epitaxial layer 1. The material of the epitaxial layer 2 of the detector is two-dimensi...

Embodiment 2

[0036] Such as figure 2 As shown, the ultraviolet / infrared dual-color detector based on boron nitride is composed of a substrate 3 , an ultraviolet detector epitaxial layer 1 , an isolation layer 4 and an infrared detector epitaxial layer 2 . The ultraviolet detector epitaxial layer 1 is cube-shaped, and the lower surface is the same as the upper surface size of the substrate 3, and is fixed on the upper surface of the substrate 3 (the substrate 3 is a sapphire substrate), and the material of the ultraviolet detector epitaxial layer 1 is Three-dimensional boron nitride, the thickness of the epitaxial layer 1 of the ultraviolet detector is 100 nanometers. The isolation layer 4 is in the shape of a cube, and the lower surface is the same size as the upper surface of the ultraviolet detector epitaxial layer 1, the lower surface of the isolation layer 4 is fixed on the upper surface of the ultraviolet detector epitaxial layer 1, and the material of the isolation layer 4 is dielec...

Embodiment 3

[0038] Such as image 3 As shown, the ultraviolet / infrared dual-color detector based on boron nitride is composed of a substrate 3, an ultraviolet detector epitaxial layer 1 and an infrared detector epitaxial layer. The size of the upper surface is the same, fixed on the upper surface of the substrate 3 (substrate 3 is a sapphire substrate), the material of the ultraviolet detector epitaxial layer 1 is three-dimensional boron nitride, and the thickness of the ultraviolet detector epitaxial layer 1 is 200 nanometers . The infrared detector epitaxial layer is a patterned array structure, which is composed of a plurality of array units 2-1 arranged in an array. The shape of the array unit 2-1 is a cube, and the lower surface is fixed on the upper surface of the ultraviolet detector epitaxial layer 1. Above, the material of the array unit 2-1 is two-dimensional boron nitride, and the thickness of the infrared detector epitaxial layer 2 is 60 nanometers.

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Abstract

The invention relates to a boron nitride-based ultraviolet / infrared dual-color detector, which belongs to the technical field of semiconductor photodetectors. It solves the problems that the ultraviolet / infrared dual-color detector in the prior art cannot realize efficient ultraviolet and infrared detection, is limited by low temperature applications, has toxic raw materials, cumbersome preparation, and inevitably introduces a large amount of pollutants during preparation. The two-color detector of the present invention is composed of a substrate, an epitaxial layer of an ultraviolet detector and an epitaxial layer of an infrared detector. The epitaxial layer of the ultraviolet detector is a continuous layer structure, fixed on the upper surface of the substrate, and the material is three-dimensional boron nitride. The infrared detector epitaxial layer has a continuous layer structure or a patterned structure, is fixed on the upper surface of the ultraviolet detector epitaxial layer, and is made of two-dimensional boron nitride. The two-color detector uses the intrinsic ultraviolet absorption performance of three-dimensional boron nitride and the phonon polarized infrared absorption performance of two-dimensional boron nitride to realize simultaneous detection of ultraviolet and infrared. The use of this detector is not limited by low temperature, and it is safe and environmentally friendly , The preparation is simple.

Description

technical field [0001] The invention belongs to the technical field of semiconductor photodetectors, in particular to a boron nitride-based ultraviolet / infrared dual-color detector. Background technique [0002] Ultraviolet detectors and infrared detectors are two common detectors that are widely used in military and civilian applications. The ultraviolet / infrared dual-color detectors that integrate the detection of the two bands can suppress background noise and reduce the false alarm rate. One of the research hotspots of technological development. However, the development of ultraviolet / infrared dual-color detectors is still in its infancy, and the material of the dual-color detectors is one of the problems to be solved urgently. [0003] In the existing technology, with the improvement of the quality of wide-bandgap semiconductor materials, the preparation process of high-quality multi-quantum well device structures has gradually matured, and the GaN / AlGaN quantum well s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0304H01L31/0352H01L31/101
CPCH01L31/03044H01L31/0352H01L31/101
Inventor 黎大兵贾玉萍孙晓娟蒋科石芝铭刘新科陈洋
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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