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Preparation method of molybdenum sulfide two-dimensional material growing on Sappire substrate

A sapphire substrate and two-dimensional material technology, which is applied in the field of preparation of two-dimensional molybdenum sulfide materials, can solve problems such as difficult sample peeling to a single layer, irregular sample shape and size, preparation and performance impact, etc., and the growth conditions can be achieved. Variable controllable, large sample size, improved shape

Inactive Publication Date: 2020-01-10
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, although the peeling method is simple to operate, the shape and size of the obtained sample are irregular, and it is difficult to peel the sample into a single layer, and the residual glue introduced during the peeling process has a great impact on the later device preparation and performance; Physical vapor transport uses powdered molybdenum sulfide source, which has been proven to grow micron-scale single-crystal single-layer molybdenum disulfide samples with high optical quality, but the grown single crystals are generally small in size.

Method used

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  • Preparation method of molybdenum sulfide two-dimensional material growing on Sappire substrate
  • Preparation method of molybdenum sulfide two-dimensional material growing on Sappire substrate
  • Preparation method of molybdenum sulfide two-dimensional material growing on Sappire substrate

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Embodiment 1

[0035] (1) Using α-Al 2 o 3 Sapphire substrate (ZMKJ 2INCH A-axis), without any pretreatment, the substrate morphology is as follows figure 1 shown;

[0036] (2) Transfer the Sapphire substrate into the quartz table in the MOCVD cavity, the pressure in the cavity is controlled at 20Torr, and the cavity is always filled with N 2 20slm;

[0037] (3) Reaction by chemical vapor deposition method: Slowly increase the growth temperature in the MOCVD chamber to 1000°C in 10 minutes, and keep the temperature at a constant temperature for 5 minutes; first pass 0.1slm H 2 S gas source for 10 minutes to passivate the surface of the Sapphire substrate, the morphology effect is as follows figure 2 shown; then pass through 5×10 -5 slm Mo(CO) 6 gas source while maintaining H 2 Injection of S, MoS at a growth temperature of 1000°C 2 Constant temperature growth for 5 minutes; after the constant temperature growth is completed, first stop the Mo(CO) 6 Gas source, keep feeding H 2 S ...

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Abstract

The invention discloses a preparation method of a MoS2 two-dimensional material growing on a Sappire substrate. The method comprises the following steps: 1, preparing the substrate: adopting the Sappire substrate without any pretreatment; 2, preparing a raw material: conveying the Saphire substrate to a quartz table in an MOCVD cavity, controlling the pressure in the cavity to be 20 Torr, and introducing N220 slm into the cavity all the time; and 3, reacting by a chemical vapor deposition technology: raising the temperature in the cavity to the growth temperature, sequentially introducing a H2S gas source and Mo(CO)6, carrying out constant-temperature growth, reducing the temperature to the room temperature, and taking out the obtained sample to obtain the MoS2 two-dimensional material growing on the Saphire substrate. The method has the advantages of effectiveness in control of the nucleation density, uniformity and grain orientation of MoS2, and high feasibility.

Description

technical field [0001] The present invention relates to MoS 2 The technical field of two-dimensional materials, in particular, relates to a preparation method of a molybdenum sulfide two-dimensional material grown on a sapphire substrate. Background technique [0002] Monolayer transition metal chalcogenides have attracted extensive attention in recent years because of their excellent properties in fundamental physics such as mechanics, heat, optics, and electricity. Among them, single-layer molybdenum disulfide is the most typical transition metal chalcogenide. Due to its wide range of sources and good relative stability, it has been studied more. So far, it has been found that monolayer semiconductor molybdenum disulfide can be used to make piezoelectric transistors, generators, ultra-sensitive photodetectors, chiral light-emitting transistors, high-performance integrated circuits, etc. To realize the practical application of these devices, the most basic thing is the la...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B25/00C30B29/46C23C16/30
CPCC23C16/305C30B25/00C30B29/46
Inventor 莫炯炯王志宇陈华郁发新
Owner ZHEJIANG UNIV
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