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Preparation method of nanofiltration membrane, and nanofiltration membrane prepared therethrough

A nanofiltration membrane and base membrane technology, applied in the field of water treatment membranes and nanofiltration membranes, can solve the problems of low acid-resistant nanofiltration membrane performance, non-continuous production, and high production costs, and achieve environmentally friendly preparation, low cost, and excellent acid resistance. sexual effect

Active Publication Date: 2020-02-04
VONTRON TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Aiming at the technical problems of discontinuous preparation, non-continuous production, long production cycle, high production cost and low performance of the prepared acid-resistant nanofiltration membranes in the large-scale production of acid-resistant nanofiltration membranes, this application provides a A kind of preparation method that can realize continuous production of acid-resistant nanofiltration membrane with high performance (high desalination rate and high flux) and nanofiltration membrane prepared therefrom

Method used

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  • Preparation method of nanofiltration membrane, and nanofiltration membrane prepared therethrough
  • Preparation method of nanofiltration membrane, and nanofiltration membrane prepared therethrough
  • Preparation method of nanofiltration membrane, and nanofiltration membrane prepared therethrough

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preparation example Construction

[0037] In one embodiment, the application provides a kind of preparation method of nanofiltration membrane, it comprises the following steps:

[0038] dissolving the polymer in a solvent to prepare a polymer solution, and solidifying the polymer solution on a support material to form a basement membrane (hereinafter referred to as "basement membrane preparation process");

[0039] Applying the first liquid phase solution and the second liquid phase solution sequentially on the base film to form a nascent eco-film (hereinafter referred to as "nascent eco-film preparation process");

[0040] Using a solution containing an alkaline substance to perform densification treatment on the nascent film (hereinafter referred to as "densification treatment process");

[0041] Treat the densified nascent membrane with a solution containing an acidic substance (hereinafter referred to as "flux enhancement process");

[0042] After post-treatment and drying, the nanofiltration membrane is o...

Embodiment 1

[0087] (1) Preparation of base film

[0088] Add 200kg of polyether nitrile ketone (number-average molecular weight: 23000Da) and 20kg of n-butanol into 1000L of N-methylpyrrolidone solvent, stir at 25°C for 12 hours to dissolve completely; then filter, Stand for defoaming at 25°C for 12 hours to obtain a uniform and stable casting solution for use.

[0089] The prepared casting solution is evenly coated on the non-woven fabric substrate by a flat scraping machine, and then enters the circulating cooling water tank, and then passes through the normal temperature water tank and the 75°C water tank to ensure complete solvent exchange in the film; during the coating process The ambient temperature is 25°C, the ambient humidity is 40%; the air residence time for evaporation is 5s, the film scraping speed is 8m / min, and the film thickness including the non-woven substrate is 6.5mil. According to performance evaluation, the molecular weight cut-off of the prepared base film is 2000...

Embodiment 2

[0097] (1) Preparation of base film

[0098] Add 200kg polyethersulfone (number average molecular weight 35000Da) and 20kg polyethylene glycol (number average molecular weight 6000Da) into 1000L N,N-dimethylacetamide solvent, stir at 25°C for 12h to make it completely Dissolve; then filter it, and let it stand for defoaming at 25°C for 12 hours to obtain a uniform and stable casting solution for use.

[0099] The prepared casting solution is evenly coated on the non-woven fabric substrate by a flat scraping machine, and then enters the circulating cooling water tank, and then passes through the normal temperature water tank and the 75°C water tank to ensure complete solvent exchange in the film; during the coating process The ambient temperature is 25°C, the ambient humidity is 40%; the air residence time for evaporation is 5s, the film scraping speed is 8m / min, and the film thickness including the non-woven substrate is 6.5mil. According to performance evaluation, the molecu...

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Abstract

The invention relates to a preparation method of a nanofiltration membrane, and the nanofiltration membrane prepared therethrough. The nanofiltration membrane prepared by adopting the preparation method can realize continuous production of the acid-resistant nanofiltration membrane with a high desalination rate and a high flux.

Description

technical field [0001] The present application relates to the technical field of water treatment membranes, more specifically to the technical field of nanofiltration membranes, in particular to a preparation method capable of realizing continuous production of acid-resistant nanofiltration membranes with high desalination rate and high flux and nanofiltration membranes prepared therefrom membrane. Background technique [0002] The traditional nanofiltration membrane material is a polyamide nanofiltration membrane. In a strong acid environment, due to the electron-withdrawing effect of the carbonyl group in the polyamide bond, the electron cloud concentrates towards the carbonyl oxygen, and the H on the amide N is in an electron-deficient state, resulting in nucleophilicity. The substitution reaction rearranges the molecules and leads to the breakage of the amide bond, causing defects in the functional layer and affecting the performance of the membrane. [0003] Acid-resis...

Claims

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Application Information

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IPC IPC(8): B01D67/00B01D69/02B01D61/00C02F1/44C02F101/10C02F101/20
CPCB01D67/0002B01D67/0006B01D69/02B01D61/027C02F1/442B01D2259/40083B01D2325/30C02F2101/10C02F2101/20C02F2101/203Y02A20/131B01D69/1216B01D69/1071B01D69/1251B01D2323/22B01D2323/12B01D2323/216B01D2323/48B01D67/0093B01D67/0095B01D71/42B01D71/58B01D69/105B01D71/60B01D71/68B01D2323/08B01D2323/36B01D2325/34C02F2101/101C02F2103/16
Inventor 胡利杰梁松苗金焱张佳佳余兴学
Owner VONTRON TECH CO LTD