Preparation method of alkali metal atom micro air chamber based on MEMS process

An alkali metal and gas chamber technology, applied in the field of MEMS, can solve problems such as complex manufacturing process, poor sealing, and poor signal-to-noise ratio, achieve smaller volume, eliminate residual stress and warping deformation, and avoid attenuation or damage Effect

Pending Publication Date: 2020-02-07
ZHONGBEI UNIV
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the technical bottleneck problems of the conventional atomic gas chamber produced by the existing MEMS micromachining technology, such as poor signal-to-noise ratio

Method used

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  • Preparation method of alkali metal atom micro air chamber based on MEMS process
  • Preparation method of alkali metal atom micro air chamber based on MEMS process
  • Preparation method of alkali metal atom micro air chamber based on MEMS process

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Embodiment Construction

[0033] Due to the activity of alkali metal atoms, their simple substances are generally stored in glass containers, so the first choice for packaging materials is glass. Secondly, because it uses coherent beams to excite alkali metal atoms, the packaging of alkali metals must meet the following conditions:

[0034] (1) Alkali metal element must exist in the package cavity contents;

[0035] (2) The packaging cavity must be able to pass the light beam, and the light transmittance must be good;

[0036] (3) The packaging cavity must be able to withstand a certain temperature;

[0037] (4) The packaging material must not be magnetized;

[0038] (5) Packaging materials must meet the needs of MEMS processing and have a high surface cleanliness;

[0039]Therefore, in the present invention, a 4-inch P-type silicon wafer is selected as the structural material of the atomic gas chamber, and the thickness is 1.5 mm. Glass is generally used as a substrate or packaging component in t...

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Abstract

The invention discloses a preparation method of a soda ash metal atom micro air chamber based on an MEMS (Micro Electro Mechanical System) process. The preparation method comprises the steps of RCA (Reactive Clear Adhesive) cleaning, photoetching, etching low-temperature anodic bonding and scribing. The high-precision, low-stress and high-purity MEMS atomic air chamber can be manufactured, and (1)the noise problem caused by atomic depolarization relaxation due to the fact that a conventional glass-silicon-glass atomic air chamber is different in quality is avoided; (2) the problem of poor airtightness caused by weak atom bonding force of different bonding layers is solved by anodic bonding; (3) the problem of bonding failure or low air tightness caused by poor surface flatness is solved;(4) the problem of low density caused by overflow of alkali metal is solved; (5) attenuation or damage of device performance can be avoided through low-temperature bonding, and residual stress and buckling deformation introduced by high-temperature bonding are reduced or eliminated; and (6) the problem that residual reactants are easily left during preparation of the single-chamber atomic gas chamber to influence subsequent light transmission is solved, and the volume size of the single-chamber atomic gas chamber is smaller than that of a double-chamber atomic gas chamber.

Description

technical field [0001] The invention relates to the field of MEMS, in particular to a method for preparing a micro gas chamber of alkali metal atoms based on the MEMS technology. Background technique [0002] The atomic gas chamber is the core part of many atomic devices such as atomic clocks and magnetometers. The atomic gas chamber is in a light-transmitting shell of a certain shape, which seals a certain composition and quantity of buffer gas and alkali metal atoms. According to actual needs, the use of each gas chamber is different, and the types of alkali metals, gas components and pressures encapsulated in the cavity are also different. However, as an atomic gas chamber, in order to facilitate the regulation of atoms in the gas chamber by external light, heat, magnetic field, etc., the technical requirements include: it has a higher and stronger pass rate for light of a specific wavelength, so the sandwich structure of glass-silicon-glass is selected. , double-sided ...

Claims

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Application Information

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IPC IPC(8): B81C1/00
CPCB81C1/00261B81C1/00269
Inventor 王锦曦闫树斌
Owner ZHONGBEI UNIV
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