Preparation method of alkali metal atom micro air chamber based on MEMS process

Abstract

The invention discloses a preparation method of a soda ash metal atom micro air chamber based on an MEMS (Micro Electro Mechanical System) process. The preparation method comprises the steps of RCA (Reactive Clear Adhesive) cleaning, photoetching, etching low-temperature anodic bonding and scribing. The high-precision, low-stress and high-purity MEMS atomic air chamber can be manufactured, and (1)the noise problem caused by atomic depolarization relaxation due to the fact that a conventional glass-silicon-glass atomic air chamber is different in quality is avoided; (2) the problem of poor airtightness caused by weak atom bonding force of different bonding layers is solved by anodic bonding; (3) the problem of bonding failure or low air tightness caused by poor surface flatness is solved;(4) the problem of low density caused by overflow of alkali metal is solved; (5) attenuation or damage of device performance can be avoided through low-temperature bonding, and residual stress and buckling deformation introduced by high-temperature bonding are reduced or eliminated; and (6) the problem that residual reactants are easily left during preparation of the single-chamber atomic gas chamber to influence subsequent light transmission is solved, and the volume size of the single-chamber atomic gas chamber is smaller than that of a double-chamber atomic gas chamber.

Description

technical field [0001] The invention relates to the field of MEMS, in particular to a method for preparing a micro gas chamber of alkali metal atoms based on the MEMS technology. Background technique [0002] The atomic gas chamber is the core part of many atomic devices such as atomic clocks and magnetometers. The atomic gas chamber is in a light-transmitting shell of a certain shape, which seals a certain composition and quantity of buffer gas and alkali metal atoms. According to actual needs, the use of each gas chamber is different, and the types of alkali metals, gas components and pressures encapsulated in the cavity are also different. However, as an atomic gas chamber, in order to facilitate the regulation of atoms in the gas chamber by external light, heat, magnetic field, etc., the technical requirements include: it has a higher and stronger pass rate for light of a specific wavelength, so the sandwich structure of glass-silicon-glass is selected. , double-sided ...

AI Technical Summary

Problems solved by technology

[0003] In order to solve the technical bottleneck problems of the conventional atomic gas chamber produced by the existing MEMS micromachining technology, such as poor signal-to-noise ratio, poor sealing, low purity, and complicated manufacturing process, the present invention proposes a chip atomic clock micro gas chamber based on MEMS technology. chamber preparation method

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