Electrochemical polishing method for surface of copper material
An electrochemical and polishing solution technology, applied in the field of electrochemical polishing, can solve the problems of generating tiny burrs, affecting the transmission loss of vacuum electronic devices, gain output power and stability, poor surface roughness, etc., and achieve the effect of preventing corrosion.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0020] Step (1): Prepare a polishing solution with a total volume of 1L, including:
[0021] (a) take by weighing 50ml phosphoric acid, 80ml glycerol import in corrosion-resistant container, add the water of 2 / 3L, stir and dissolve to obtain the first intermediate solution;
[0022] (b) Weigh 2g thiourea and join in the first intermediate solution, stir and dissolve to obtain the second intermediate solution;
[0023] (c) Measure 0.5ml of polyoxyethylene alkanolamide and add it into the second intermediate solution, add water to 1L, and stir evenly to obtain a polishing solution.
[0024] Step (2): immerse the copper material to be polished in the polishing solution, turn on the power and perform polishing at room temperature. The current density of the turned on power supply is 5A / dm 2 , the duty cycle is 5%, and the polishing time is 15s.
[0025] Step (3): Turn off the power, take out the copper material, rinse it, dehydrate it with ethanol, and dry it in a dryer.
Embodiment 2
[0027] Different from Example 1, in step (1), the component contents of each solute are respectively:
[0028] Phosphoric acid: 55ml
[0029] Glycerol: 90ml
[0030] Thiourea: 2.5g
[0031] Polyoxyethylene alkanolamide: 0.6ml
[0032] In step (2), the current density of the turned on power supply is 5.5A / dm 2 , the duty cycle is 10%, and the polishing time is 17s.
Embodiment 3
[0034] Different from Example 2, in step (1), the components of each solute are respectively:
[0035] Phosphoric acid: 60ml
[0036] Glycerol: 100ml
[0037] Thiourea: 3g
[0038] Polyoxyethylene alkanolamide: 0.8ml
[0039] In step (2), the current density of the turned on power supply is 6A / dm 2 , the duty cycle is 15%, and the polishing time is 20s.
PUM
Property | Measurement | Unit |
---|---|---|
Roughness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com