Infrared broadband cut-off filter, optical filter and camera

A cut-off filter and wide-band technology, applied in the field of optical film, can solve the problem of narrow cut-off width of infrared cut-off filter

Inactive Publication Date: 2020-03-27
ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The main purpose of the present invention is to provide a kind of infrared wide-band cut-off filter, optica

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Infrared broadband cut-off filter, optical filter and camera
  • Infrared broadband cut-off filter, optical filter and camera
  • Infrared broadband cut-off filter, optical filter and camera

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0060] Simulation experiment data:

[0061] Infrared broadband cut-off filter structure such as figure 1 As shown, the transparent substrate layer is a PET layer doped with a light absorber, the high refractive index material layer forming the cut-off unit is a titanium dioxide layer with a refractive index of 2.354, and the low refractive index material layer is silicon dioxide with a refractive index of 1.46. Layer, the transparent substrate layer is provided with light absorber ABS-642, and uv-531 (2-hydroxyl-4-n-octyloxybenzophenone) ultraviolet light absorber, light absorber ABS-642 is in this transparent The weight percentage in the base material layer is about 1%, and the weight percentage of the uv-531 (2-hydroxy-4-n-octyloxybenzophenone) ultraviolet light absorber in the transparent base material layer is about 1%. Due to the addition of the above-mentioned ultraviolet absorber, when the shift is performed at 0-30°, the shift amount of the UV side spectrum can be con...

Embodiment 2

[0067] The infrared wide-band cut-off filter corresponding to Example 1 was manufactured by magnetron sputtering process, and the substrate (with a PET layer of 0.05mm on the substrate) was cleaned with a clean cloth and ethanol. After degassing the vacuum chamber, use a vacuum cleaner to clean the inside of the bell jar, fill the molybdenum boat with the film material to be evaporated, and record the name of the film material of each boat. And place the substrate on the substrate frame, do not tilt the substrate. Drop the bell jar and evacuate the vacuum chamber according to the operation rules of the coating machine. When the vacuum reaches 7×10 -3 After Pa, pre-melt the film material in the molybdenum boat in turn to remove the gas in the film material. At this time, pay attention to block the film material with a baffle to ensure that the substrate will not be plated during pre-melting. When the vacuum degree reaches the requirement, the method of controlling the optica...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides an infrared broadband cut-off filter, an optical filter and a camera. The filter comprises a transparent base material layer, a near-infrared reflecting film and a light absorber, the near-infrared reflecting film is arranged on one surface of a transparent base material layer or distributed on two opposite surfaces of the transparent base material layer; the device is usedfor cutting off light with a wavelength range of 700-1300nm. The near-infrared reflecting film comprises a plurality of cut-off units; the cut-off units form m membrane stacks; assuming that the membrane system structure of the membrane stack A theta is | V theta (alpha1H beta1L alpha2H beta2L-Alpha nH betanL) |, wherein n and m are positive integers, n is larger than 3 and smaller than or equal to 80, and alpha 1, alpha 2-alpha n and beta 1, beta 2-beta n in the same membrane stack independently meet the same gradient rule on the same cosine or sine waveform; 1 < = m < = 10; and [alpha] i and[beta] i are each independently in the range of 0.2 to 1.5. The cut-off width of the infrared cut-off filter is large.

Description

technical field [0001] The invention relates to the field of optical films, in particular to an infrared wide-band cut-off filter, a filter and a camera. Background technique [0002] IRCF is the abbreviation of infrared cut-off filter. The infrared cut-off filter is an optical filter with high and low refractive index alternately coated on the optical substrate by using precision optical coating technology to achieve high transparency in the visible light region and infrared cut-off. It is used in digital imaging fields such as mobile phone cameras, computer built-in cameras, and car cameras to eliminate the influence of infrared light on CCD / CMOS imaging. [0003] By adding an infrared cut filter to the imaging system to block the part of the infrared light that interferes with the imaging quality, the resulting image can be more in line with the best feeling of the human eye. The traditional method is to form a near-infrared reflective film on the substrate. Its cut-off ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/28G02B5/22
CPCG02B5/22G02B5/282
Inventor 于甄孔德兴
Owner ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap