Accident fault-tolerant zirconium cladding tube protective coating, manufacturing method and application thereof
A technology of protective coating and zirconium cladding tube, applied in the direction of coating, metal material coating process, ion implantation plating, etc. It is ideal, and the defects increase, so as to achieve the effect of excellent resistance to high temperature water vapor oxidation, good surface protection performance, and easy penetration and oxidation.
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[0026] Another aspect of the embodiments of the present invention also provides a method for preparing an accident-tolerant zirconium cladding tube protective coating, which includes:
[0027] Provide zirconium cladding tube;
[0028] Using a chromium target as the target material, a Cr layer is deposited on the surface of the zirconium cladding tube by using high-power pulse magnetron sputtering technology to obtain an accident-tolerant protective coating for the zirconium cladding tube;
[0029] Wherein, the pulse voltage used in the high-power pulse magnetron sputtering technology is 700-800V.
[0030] In some more specific embodiments, the method includes:
[0031] (1) providing a zirconium cladding tube as a substrate;
[0032] (2) Pretreating the zirconium cladding tube;
[0033] (3) Carrying out Ar ion glow etching treatment to the pretreated zirconium cladding tube;
[0034] (4) Using a chromium target as the target material, using the protective gas argon as the w...
Embodiment 1
[0046] (1) The zirconium cladding tube is ultrasonically cleaned with acetone and ethanol successively, and then the zirconium cladding tube is fixed on the sample holder in the vacuum coating cavity;
[0047] (2) Heat the chamber to 200°C, and vacuum the chamber to 3.0×10 -3 Pa, then rotate the sample holder to the front of the chromium target and maintain the rotation, pass Ar gas into the cavity, maintain the pressure at 1.5Pa, apply a negative bias voltage of 400V to the substrate, and use Ar ion glow discharge to etch and clean the substrate 50min;
[0048] (3) Introduce Ar gas into the cavity, maintain the pressure at 0.3Pa, use high-power pulse magnetron sputtering technology to deposit a Cr layer on the surface of the zirconium cladding tube, the distance between the zirconium cladding tube and the surface of the target is 13cm, set The frequency of the high-power pulse power supply is 500Hz, the pulse width is 100μs, the power is 3.0KW, the pulse voltage is 760V, the...
Embodiment 2
[0061] (1) The zirconium cladding tube is ultrasonically cleaned with acetone and ethanol successively, and then the zirconium cladding tube is fixed on the sample holder in the vacuum coating chamber;
[0062] (2) Heat the cavity to 180°C, and vacuum the cavity to 2.0×10 -3 Pa, then rotate the sample holder to the front of the chromium target and keep it on its own rotation, pass Ar gas into the cavity, maintain the pressure at 1Pa, apply a negative bias voltage of 300V to the substrate, and use Ar ion glow discharge to etch and clean the substrate for 60min ;
[0063] (3) Introduce Ar gas into the cavity, maintain the pressure at 0.2Pa, use high-power pulse magnetron sputtering technology to deposit a Cr layer on the surface of the zirconium cladding tube, the distance between the zirconium cladding tube and the surface of the target is 12cm, set The frequency of the high-power pulsed power supply is 450Hz, the pulse width is 110μs, the power is 1.5KW, the pulse voltage is ...
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