Algan-based deep ultraviolet LED epitaxial structure and preparation method of mg-doped quantum well
An epitaxial structure and quantum well technology, which is applied in the fields of final product manufacturing, sustainable manufacturing/processing, climate sustainability, etc., can solve the difficulties in growing materials on semi-polar and non-polar surfaces, limit luminous efficiency, and light extraction Low efficiency and other issues, to achieve the effect of improving light extraction efficiency, improving radiation recombination efficiency, and enhancing radiation recombination
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[0052] The LED epitaxial structure of this embodiment includes a sapphire substrate; first grow a 20nm low-temperature AlN buffer layer on the substrate; then use pulsed atomic layer growth to grow a 650nm high-temperature AlN layer; then use 10 cycles of AlN / Al 0.5 Ga 0.5 N (5nm / 2nm) superlattice structure for stress control, while filtering dislocations, and improving the crystal quality of subsequent epitaxial growth; then grow a 1300nm non-doped AlGaN layer; and a 1700nm Si-doped n-type AlGaN layer; and then for 5 cycles of Al 0.4 Ga 0.6 N / Al 0.5 Ga 0.5 N multi-quantum well active light-emitting region, where Al 0.5 Ga 0.5 N barrier thickness is 10nm, Al 0.4 Ga 0.6 The thickness of the N well layer is 3nm, and the middle 1nm area of the well layer is 3nm doped with Mg; finally, 10nm of Mg doped p-type Al is grown. 0.6 Ga 0.4 an N electron blocking layer; and a 150nm p-type GaN layer. In the MOCVD epitaxial growth process, trimethylaluminum (TMAl) and trimethylg...
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