Method for producing photocatalyst material, method for producing material for photoelectric conversion elements, method for producing wear-resistant member, method for producing member for preventing deterioration of edible oils, photocatalyst material, material for photoelectric conversion elements, wear-resistant member, and member for preventing deterioration of edible oils
A manufacturing method and titanium oxide technology, applied in the field of metal titanium materials or titanium alloy materials, can solve problems such as high-cost cooling devices
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Embodiment 1
[0190] Average surface roughness (Ra) of titanium material with crystalline titanium oxide coating formed on the surface
[0191] (1-1) Step 1: Preparation of roughened titanium material
[0192] In order to compare the formation amount of anatase-type titanium oxide, materials were prepared under two conditions: the case of performing shot peening and the case of not performing shot peening.
[0193] In the case of the material subjected to shot blasting, the surface of the substrate was roughened on a metal titanium plate (titanium material, photoelectrode substrate) using a shot blasting apparatus (BA-1: direct pressure type, manufactured by Thick Bottom Iron Works).
[0194] First, a metal titanium plate and an abrasive (abrasive material) (alumina #150 manufactured by Nippon Lagoonite, alumina particle size 63 μm to 74 μm) were installed in the apparatus. Next, air was sucked in by the compressor, and the pressure was adjusted to 0.5 MPa.
[0195] Sandblasting was p...
Embodiment 2
[0224] Amount of crystalline titanium oxide film formed on the surface of titanium material
[0225] (2-1) Manufacture of anodized titanium material
[0226] In order to compare the formation amount of anatase-type titanium oxide (crystalline titanium oxide film), materials were prepared under two conditions: the case of performing shot peening and the case of not performing shot peening.
[0227] In the case of a material subjected to shot blasting, the surface of the substrate was roughened on a metal titanium plate (titanium material, photoelectrode substrate) using a blasting treatment device (BA-1: direct pressure type, manufactured by Atsushiki Works).
[0228] First, a metal titanium plate and an abrasive (abrasive material) (alumina #150 manufactured by Nippon Lagoonite, alumina particle size 63 μm to 74 μm) were installed in the apparatus. Next, air was sucked in by the compressor, and the pressure was adjusted to 0.5 MPa.
[0229] Abrasives (sweeping materials)...
Embodiment 3
[0247] Photocatalytic activity of titanium material with crystalline titanium oxide coating on its surface
[0248] (3-1) Manufacture of anodized titanium material
[0249] The surface of the substrate was roughened on the metal titanium plate (titanium material, photoelectrode substrate) using a sand blasting treatment device (BA-1 direct pressure type, manufactured by Atsushiki).
[0250] First, a metal titanium plate and an abrasive (abrasive material) (alumina #150 manufactured by Nippon Lagoonite, alumina particle size 63 μm to 74 μm) were installed in the apparatus. Next, air was sucked in by the compressor, and the pressure was adjusted to 0.5 MPa.
[0251] Abrasives (sweeping materials) are fired toward the substrate by direct pressure, and shot blasting is performed on one side for 30 seconds. Shot blasting is performed on both sides of the substrate.
[0252] Next, after degreasing the shot-peened titanium metal plate with trichlorethylene, a nitriding furnace...
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Abstract
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