Method for carrying out nanometer precision preparation by using femtosecond laser

A femtosecond laser and nanotechnology, applied in laser welding equipment, welding equipment, manufacturing tools, etc., can solve the problems of limited process flow, production rate and cost, limited focus spot diffraction limit, difficulty in meeting industrial mass production, etc. , achieve good processing compatibility, strong robustness, and improve the effect of precision

Active Publication Date: 2020-05-19
JILIN UNIV
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  • Description
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  • Application Information

AI Technical Summary

Problems solved by technology

The heavy dependence of these technologies on vacuum conditions limits their process flow, yield and cost, so it is difficult to meet the needs of industrial mass production
As an emerging optical processing technology, femtosecond laser has the ability to perform low-cost and fast micro-processing on the surface of almost all materials in the atmospheric environment. However, limited by the diffraction limit of the focused spot, its processing accuracy is mostly between microns to several Between hundreds of nanometers, it is difficult to meet the precision required by most nanotechnology
Up to now, how to improve the resolution of femtosecond laser surface material removal is still an open problem

Method used

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  • Method for carrying out nanometer precision preparation by using femtosecond laser
  • Method for carrying out nanometer precision preparation by using femtosecond laser
  • Method for carrying out nanometer precision preparation by using femtosecond laser

Examples

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Effect test

Embodiment 1

[0038] Nano-patterns with birefringence are prepared on titanium dioxide by using femtosecond laser for nano-precision preparation.

[0039] The initial damaged nanopore formed by femtosecond laser multiphoton excitation is used as a seed structure, and the energy and polarization state of subsequent laser pulses are adjusted in real time, so that uniform and directional optical near-field enhancement near the seed structure is used to achieve high-precision removal of processed materials. According to the geometric structure of the pre-designed nano-groove, the polarization state of the laser pulse is adjusted in real time, so that the nano-groove designed by the sum of the polarization of the laser pulse remains locally vertical, thereby preparing any given geometric pattern of the nano-groove.

[0040] The method of preparing a nanometer pattern with birefringence on titanium dioxide by using a femtosecond laser to prepare nanometer precision, the specific steps are as follo...

Embodiment 2

[0055] A method for preparing periodic nano-grooves on the surface of titanium dioxide and quartz glass by using femtosecond laser for nano-precision preparation.

[0056] Large-area nanostructures of any given shape can be rapidly prepared by periodically depositing seed structures and adjusting the energy and polarization state of laser pulses in real time.

[0057] Fabrication of Periodic Nanogroove Arrays on TiO2 and Quartz Glass Surfaces:

[0058] (1) Leveling of samples;

[0059] Same as in Example 1, wherein the spot of the femtosecond laser is enlarged by 2 times after beam expansion.

[0060] (2), preparation of seed structure;

[0061] As in Example 1, it is enough to periodically prepare the seed structure on the surface of the sample.

[0062] (3) Raster scanning to prepare large-area nanostructures:

[0063]When machining on titanium dioxide surfaces, reduce the energy of the laser pulse to between 83% of the material damage threshold (for quartz glass, reduce...

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Abstract

The invention discloses a method for carrying out nanometer precision preparation by using femtosecond laser, and belongs to the technical field of laser processing. According to the method, an initial damage nanopore formed through femtosecond laser multi-photon excitation is taken as a seed structure, energy and polarization states of subsequent laser pulses are regulated in real time, uniform and directional optical near-field enhancement is generated near the seed structure, finally high-precision removal of processed material is achieved, and due to high localization of near-field light spot energy in space, femtosecond laser pulses with a wavelength of 800 nm are utilized to achieve the processing precision of the thinnest 18 nm line width, and a resolution ratio reaches 1 / 40 of thewavelength. According to the method for carrying out nanometer precision preparation by using the femtosecond laser, a vacuum environment is not needed, the method has good atmosphere / solution processing compatibility, and rapid printing of a large-area periodic micro-nano structure can be carried out by combining parallel deposition of the seed structure and grating scanning, so that the manufacturing cost of a device can be effectively reduced, and the method is more suitable for industrial production.

Description

technical field [0001] The invention belongs to the technical field of laser processing, and specifically relates to the use of femtosecond laser multiphoton excitation to generate initial damaged nanoholes on the surface of materials as seed structures, so as to guide the directional localized near-field generated by subsequent laser pulses near the seed structures Enhanced to remove materials to achieve high-precision laser nanoprocessing in an atmospheric environment. [0002] technical background [0003] The development of modern nanotechnology and quantum technology must rely on high-precision micro-nano processing technology for device preparation. The new generation of micro-nano manufacturing methods that are still under development, such as electron beam lithography (EBL) and focused ion beam (FIB), can provide high processing resolution, but they all require a very high degree of vacuum to work. Ensure the effective propagation and convergence of high-energy parti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/0622B23K26/064B23K26/082B23K26/70
CPCB23K26/0624B23K26/0648B23K26/064B23K26/082B23K26/702G02B27/286G02B27/283B23K26/355G02B5/30B23K26/364B23K2103/14B23K2103/54B23K26/0006B23K26/032B23K26/0643B23K26/0652B23K26/0853G02B2006/12116H01S3/10061
Inventor 孙洪波李臻赜陈岐岱
Owner JILIN UNIV
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