Quantum dot light-emitting diode and preparation method thereof
A quantum dot light-emitting and diode technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve the problems of low luminous efficiency of quantum dot light-emitting diodes
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specific Embodiment 1
[0053] Specific embodiment 1, the preparation steps of the quantum dot light-emitting diode device are as follows:
[0054] First, the patterned ITO substrate was placed in acetone, washing solution, deionized water, and isopropanol in sequence for ultrasonic cleaning, and each step of ultrasonic cleaning lasted for about 15 minutes. After the ultrasound is completed, place the ITO substrate in a clean oven to dry for later use.
[0055] After the ITO substrate was dried, the surface of the ITO substrate was treated with UV-ozone for 5 minutes to further remove the organic matter attached to the surface of the ITO substrate and improve the work function of the ITO substrate.
[0056] Then, deposit a layer of hole injection layer PEDOT:PSS on the ITO substrate processed in the previous step. Done in the air.
[0057] Next, place the dried substrate coated with the hole injection layer in a nitrogen atmosphere, deposit a layer of hole transport layer material TFB, the thicknes...
specific Embodiment 2
[0061] Specific embodiment two, the preparation steps of the quantum dot light-emitting diode device are as follows:
[0062] First, the patterned ITO substrate was placed in acetone, washing solution, deionized water, and isopropanol in sequence for ultrasonic cleaning, and each step of ultrasonic cleaning lasted for about 15 minutes. After the ultrasound is completed, place the ITO substrate in a clean oven to dry for later use.
[0063] After the ITO substrate was dried, the surface of the ITO substrate was treated with UV-ozone for 5 minutes to further remove the organic matter attached to the surface of the ITO substrate and improve the work function of the ITO substrate.
[0064] Then, deposit a layer of hole injection layer PEDOT:PSS on the ITO substrate processed in the previous step. Done in the air.
[0065] Next, place the dried substrate coated with the hole injection layer in a nitrogen atmosphere to deposit a layer of hole transport layer material PVK with a th...
specific Embodiment 3
[0069] Specific embodiment three, the preparation steps of the quantum dot light-emitting diode device are as follows:
[0070] First, the patterned ITO substrate was placed in acetone, washing solution, deionized water, and isopropanol in sequence for ultrasonic cleaning, and each step of ultrasonic cleaning lasted for about 15 minutes. After the ultrasound is completed, place the ITO substrate in a clean oven to dry for later use.
[0071] After the ITO substrate was dried, the surface of the ITO substrate was treated with UV-ozone for 5 minutes to further remove the organic matter attached to the surface of the ITO substrate and improve the work function of the ITO substrate.
[0072] Then, deposit a layer of hole injection layer PEDOT:PSS on the ITO substrate processed in the previous step. Done in the air. .
[0073] Next, place the dried substrate coated with the hole injection layer in a nitrogen atmosphere to deposit a layer of hole transport layer material PVK with...
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