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Surface coating method of metal plate

A metal plate and surface coating technology, which is applied in the field of metal surface treatment, can solve the problems of low production efficiency and achieve the effects of improved production efficiency, good quality and low cost

Active Publication Date: 2020-07-14
PANZHIHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, after it is heated to 300-500°C, high-purity argon gas is introduced into the vacuum chamber of the coating equipment, the bias power is turned on, and the workpiece is bombarded and cleaned, so the production efficiency is not high.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0027] In order to solve the technical problem of the present invention, an embodiment of the present invention is:

[0028] Put the coating material into the plasma etching chamber of the metal strip, use the steel plate as the base material, and pass in Ar gas, so that the base material is etched in the plasma etching chamber to achieve the purpose of cleaning the surface.

[0029] Wherein, the above-mentioned plasma etching is intermittent, the sputtering etching time of each plasma etching is 1-60s, and the shutdown cooling time is 10-3600 seconds.

[0030] Wherein, the above-mentioned steel plate has a width of 100-1500 mm and a thickness of 0.1-0.5 mm.

[0031] Wherein, the above-mentioned plasma etching chamber is equipped with a vacuum processing chamber before and after or is directly evacuated without a vacuum processing chamber, and the vacuum degree of the working chamber of the plasma etching chamber is controlled to be 10 -3 ~10 -4 Pa.

[0032] Wherein, the fl...

Embodiment 1

[0042] Put the coating material titanium into the metal strip plasma etching chamber, use the 410 steel plate with a width of 500mm and a thickness of 0.5mm as the base material, and put the 410 base material into the operating table. Control the vacuum degree of the working chamber of the plasma etching chamber to 4×10 through vacuum pretreatment -3 Pa. The flow rate of the Ar gas introduced was 520 sccm (standard cubic centimeter per minute). The vacuum degree of the working chamber is kept at 2×10 -1 Pa. Control power conditions are: frequency 20KHz, working voltage 400V, current 15A. The positive and negative pulse duty cycle of the power supply is 40%. The base distance of the target for plasma etching is 80 mm. The magnetic field strength condition was 10 mT. The etching time of each sputtering of plasma etching is 2s, and the cooling time of shutdown is 20 seconds. The actual effective etching time is 3600 seconds. The temperature of the metal sheet after plasma...

Embodiment 2

[0047] Put the coating material titanium into the metal strip plasma etching chamber, use the 410 steel plate with a width of 600mm and a thickness of 0.5mm as the base material, and put the 410 base material into the operating table. Control the vacuum degree of the working chamber of the plasma etching chamber to 2×10 through vacuum pretreatment -3 Pa. The flow rate of the Ar gas introduced was 860 sccm (standard cubic centimeter per minute). The vacuum degree of the working chamber is kept at 5×10 -1 Pa. Control power conditions are: frequency 30KHz, working voltage 800V, current 8A. The positive and negative pulse duty cycle of the power supply is 50%. The base distance of the target for plasma etching is 70mm. The magnetic field strength condition is 35mT. The etching time of each sputtering of plasma etching is 3s, and the cooling time of shutdown is 20 seconds. The temperature of the metal sheet after plasma etching reaches 800°C. A metal plate with a clean surf...

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Abstract

The invention relates to a surface coating method of a metal plate, and belongs to the technical field of metal surface treatment. The surface coating method of the metal plate comprises the followingsteps of a, intermittent plasma etching, specifically, intermittent plasma etching is directly carried out on the metal plate by using Ar with the flow of 50-4000 sccm under the vacuum degree of 1-10<-2>Pa, and the intermittent plasma etching is stopped until the temperature of the metal plate reaches 200-1200 DEG C; and b, coating, specifically, after the intermittent plasma etching is stopped in the step a, film coating is immediately conducted on the metal plate, wherein each sputtering etching time of the intermittent plasma etching is 1-60 seconds, and the shutdown cooling time of the intermittent plasma etching is 10-3600 seconds. According to the surface coating method of the metal plate, continuous production can be realized, production efficiency is high, the metal plate is prevented from being ablated, the surface coating method has the advantages of low cost, no pollution, high speed, high film adhesion and high efficiency.

Description

technical field [0001] The invention relates to a surface coating method for metal plates, which belongs to the technical field of metal surface treatment. Background technique [0002] Metal surfaces generally require painting, pattern printing or surface coating. The purpose of these surface treatments is to artificially form a surface layer on the surface of the base material that has different mechanical, physical and chemical properties from the base. More advanced surface treatment includes chemical vapor deposition CVD, physical vapor deposition PVD, ion implantation, ion plating, laser surface treatment, etc. The purpose of surface treatment is to meet the corrosion resistance, wear resistance, decoration or other special functional requirements of the product. [0003] For metal surface processing, chemical vapor deposition CVD, physical vapor deposition PVD, ion implantation, ion plating, and laser surface treatment often require operations such as cleaning, swee...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/30C23C14/16C23C14/02
CPCC23C14/30C23C14/022C23C14/16
Inventor 赖奇廖先杰李亮刘翘楚罗学萍
Owner PANZHIHUA UNIV
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