An Excitation Modulated Anode Assisted Magnetron Sputtering Ion Coating System

A technology of ion coating and magnetron sputtering, which is applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc., can solve the problems that target poisoning is difficult to control and affects the controllability and repeatability of coating, and achieves Increased collision probability, increased ionization rate and sputtering yield, and the effect of increasing sputtering yield

Active Publication Date: 2021-05-04
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0005] However, the above-mentioned patents are difficult to control the target poisoning caused by reactive magnetron sputtering, which affects the controllability and repeatability of the coating

Method used

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  • An Excitation Modulated Anode Assisted Magnetron Sputtering Ion Coating System

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Embodiment Construction

[0028] Such as figure 1 As shown, an excitation modulation anode assisted magnetron sputtering ion coating system includes a vacuum chamber 1 connected together, a vacuum pump group 8, a vacuum measuring device 11 composed of a group of composite vacuum gauges, a power control cabinet and an automatic programming Controlled PLC+ICP+closed-loop control system9. One side of the vacuum chamber 1 is connected to the vacuum pump group 8 through the pipeline valve body 7 through the air pumping hole, and the other side is connected to the vacuum measuring device 11; A pair of planar magnetron targets 5 are arranged symmetrically on the front of the vacuum chamber door 2, and two pairs of auxiliary water-cooled anodes 4 with their own gas distribution systems are arranged symmetrically on the side; excitation field modulation coils 6 are arranged on the periphery of each auxiliary water-cooled anode 4; Two pairs of twin column magnetron sputtering cathodes 3 are symmetrically insert...

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Abstract

The invention relates to an excitation modulation anode assisted magnetron sputtering ion coating system, comprising a connected vacuum cavity, a vacuum pump group, a vacuum measuring device, a power control cabinet and a PLC+ICP+closed-loop control system. One side of the vacuum chamber is connected to the vacuum pump group through the pumping hole through the pipeline valve body, and the other side is connected to the vacuum measuring device; the vacuum chamber is equipped with a clam-type vacuum chamber door; the front of the vacuum chamber door is symmetrical There is a pair of planar magnetron targets, and two pairs of auxiliary water-cooled anodes with their own gas distribution systems are symmetrically arranged on the side; excitation field modulation coils are installed on the periphery of each auxiliary water-cooled anode; two pairs of twin columnar magnetrons are symmetrically inserted in the vacuum chamber. Sputtering cathode; columnar magnetron sputtering cathode, auxiliary water-cooled anode, planar magnetron target, excitation field modulation coil, pipeline valve body, vacuum pump unit, and vacuum measuring device are connected to PLC+ICP+closed-loop control system and power supply through the line bridge respectively Cabinet connected. The invention can effectively prevent target poisoning and improve coating quality.

Description

technical field [0001] The invention relates to the technical field of vacuum coating and surface treatment, in particular to an excitation modulation anode assisted magnetron sputtering ion coating system. Background technique [0002] Material consumption and mechanical failure caused by friction and wear on the surface of industrial machinery lead to waste of energy and resources. Traditional surface treatment technologies, such as electroplating, micro-arc oxidation, anodic oxidation, etc., are gradually unable to meet the needs of the development of modern human society due to the strengthening of environmental protection policies and environmental protection awareness, and the development of green and environmentally friendly coating technologies is urgently needed. [0003] Therefore, arc ion plating, chemical vapor deposition and magnetron sputtering have received more and more attention. Taking magnetron sputtering as an example, balanced magnetron sputtering, unba...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/54
CPCC23C14/352C23C14/54
Inventor 张斌张俊彦高凯雄强力
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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