Apparatus and method for processing, coating or curing a substrate

Abstract

An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion(204); a third elongate magnet (408), substantially parallel to the first elongate magnet,having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion.

Description

Background technique [0001] Transparent ceramic-based barrier coatings are suitable for a variety of applications, including packaging oxygen- or moisture-sensitive food products, encapsulating gas- or moisture-sensitive electronic product components, and various other functional applications requiring barrier properties. These coatings can be applied to flexible substrates using a roll to roll process. [0002] Various methods of producing barrier coatings are known, for example, high-speed physical vapor deposition (Physical Vapour Deposition, PVD). This method is relatively high-speed and low-cost, but produces poor barriers. Enhanced barrier properties can be achieved by a variety of known techniques, including reactive sputtering, chemical vapor deposition, and atomic layer deposition. However, all of these techniques are slow and therefore expensive, especially when used in roll-to-roll processing. [0003] Plasma Enhanced Chemical Vapor Deposition (PECVD) is also a k...

AI Technical Summary

Problems solved by technology

However, this arrangement has many disadvantages

Specifically, it is very difficult to ensure that the runway is stable and the energy supply is balanced

Any differences and variations in air pressure in the vicinity of runways can lead to uneven supply of power to individual runways, resulting in local variations in applied power, affecting the uniformity of the material produced and the eventual long-term viability of any such process

Therefore, when multiple independent raceways are generated from a single power source, this arrangement requires very high engineering tolerances and tight control, as well as consistency of magnet and process pressure

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