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High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide

A low-temperature plasma and discharge device technology, applied in the field of ion chemistry, can solve the problems of low hydrogen sulfide conversion rate, inability to achieve large flow rate, and high energy consumption, and achieve the effect of improving the conversion rate

Active Publication Date: 2020-07-24
CHINA PETROLEUM & CHEM CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention is to provide a new high-pass Measuring low-temperature plasma discharge device and method for decomposing hydrogen sulfide using the device

Method used

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  • High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide
  • High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide
  • High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0119] use figure 1 The shown device carries out hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the low-temperature plasma discharge device are as follows:

[0120] Devices include:

[0121] a first cavity, the first cavity is respectively provided with a first inlet and a first outlet;

[0122] A high-voltage electrode, the high-voltage electrode is arranged in the first cavity, and the high-voltage electrode is provided with 5 layers in the first cavity; in each layer structure containing the high-voltage electrode, the high-voltage electrode The number is 7, each of the high-voltage electrodes is parallel to each other, and there is a gap between two adjacent high-voltage electrodes, the material forming the high-voltage electrodes is a hollow stainless steel metal tube, and the size of each of the high-voltage electrodes is the same ;

[0123] A ground electrode, the ground electrode is arranged in the first cavity, and ...

Embodiment 2

[0136] This embodiment adopts figure 2 The shown device carries out hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the discharge device are as follows:

[0137] Devices include:

[0138] a first cavity, the first cavity is respectively provided with a first inlet and a first outlet;

[0139] A high-voltage electrode, the high-voltage electrode is arranged in the first cavity, and the high-voltage electrode is provided with 5 layers in the first cavity; in each layer structure containing the high-voltage electrode, the high-voltage electrode The number is 7, each of the high-voltage electrodes is parallel to each other, and there is a gap between two adjacent high-voltage electrodes, the material forming the high-voltage electrodes is a hollow graphite tube, and the size of each of the high-voltage electrodes is the same;

[0140] A ground electrode, the ground electrode is arranged in the first cavity, and the ground electro...

Embodiment 3

[0153] This embodiment is carried out using a discharge device similar to that of Embodiment 1. The difference is that the barrier medium in the discharge device of this embodiment is arranged on the outer surface of the high-voltage electrode and the ground electrode, that is, a double dielectric barrier discharge.

[0154] And the gap between two adjacent high-voltage electrodes and two adjacent ground electrodes is equal, and the gap between two adjacent layer structures is 1.2 times the gap between two adjacent high-voltage electrodes, L 2 The ratio to the thickness D1 of the barrier medium is 15:1;

[0155] The size of each of the high-voltage electrodes is the same as that of each of the ground electrodes, and the ratio of diameter to length is 1:130;

[0156] L 2 and the length of the discharge tube L 3 The ratio between them is 1:300;

[0157] The volume of the first cavity of the low-temperature plasma discharge device of this embodiment is 3.2L.

[0158] Pass H ...

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Abstract

The invention relates to the field of plasma chemistry, and discloses a high-flux low-temperature plasma discharge device and a method for decomposing hydrogen sulfide. The high-flux low-temperature plasma discharge device comprises a first cavity (1), a second cavity (2) which is nested in the first cavity (1), a high-voltage electrode (3) and a grounding electrode (4) which are arranged in the first cavity (1), and a blocking medium which is arranged on the outer surface(s) of the high-voltage electrode (3) and / or the grounding electrode (4). The low-temperature plasma discharge device provided by the invention has the advantages of high hydrogen sulfide conversion rate, low energy consumption and capability of realizing high-flow hydrogen sulfide treatment.

Description

technical field [0001] The invention relates to the field of plasma chemistry, in particular to a high-throughput low-temperature plasma discharge device and a method for decomposing hydrogen sulfide. Background technique [0002] Hydrogen sulfide (H 2 S) is a highly toxic and foul-smelling acid gas, which not only causes corrosion of metals and other materials, but also endangers human health and pollutes the environment. At present, large and medium-sized refineries in my country adopt the traditional Claus method (Claus) to treat 2 S tail gas, and recover sulfur. The method recovers only the sulfur in hydrogen sulfide, but converts the valuable hydrogen into water. From the perspective of comprehensive utilization of resources, hydrogen resources have not been effectively utilized in the traditional hydrogen sulfide recovery process. [0003] Therefore, the decomposition of hydrogen sulfide into sulfur and hydrogen has gradually become a technical field that researche...

Claims

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Application Information

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IPC IPC(8): C01B17/04C01B3/04H05H1/24
CPCC01B17/0495C01B3/04H05H1/2406Y02E60/36
Inventor 张婧徐伟张铁任君朋王世强张树才王林关银霞孙峰刘全桢石宁周明川李亚辉唐诗雅
Owner CHINA PETROLEUM & CHEM CORP
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