Naturally degradable nanofiber environment-friendly mask

A technology of nanofibers and masks, applied in the field of environmental protection masks, can solve the problems of large fluidity and dispersion, environmental pollution, environmental damage, etc., and achieve the effect of improving electrostatic holding capacity, improving capture efficiency, and improving holding capacity

Pending Publication Date: 2020-07-28
BEIJING UNIV OF CHEM TECH
View PDF0 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the other hand, masks are personal protection products with high fluidity and dispersion. Centralized recycling and incineration is not only costly but also difficult to implement
Therefore, a large number of discarded polypropylene masks are bound to cause serious damage to the environment
[0003] Aiming at the problem that traditional waste masks are likely to cause environmental pollution, the present invention proposes a naturally degradable nanofiber environmental protection mask

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Naturally degradable nanofiber environment-friendly mask
  • Naturally degradable nanofiber environment-friendly mask
  • Naturally degradable nanofiber environment-friendly mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Polylactic acid is used as the main material of the mask, and the melt differential electrospinning technology is used to collect it by rollers to prepare a polylactic acid nanofiber orientation film with an average diameter of 300nm and an area density of 0.3g / m2 for use in masks. An inner filter layer 1 with a micro-nano gradient structure is fabricated. By adjusting the spinning voltage of melt differential electrospinning, changing the drafting force of the electric field, and collecting it by rollers, an oriented nanofiber film with an average diameter of 800nm ​​and an area density of 3g / m2 was prepared for making Intermediate filter layer 2 with micro-nano gradient structure. The polylactic acid material and the silica powder with an average diameter of 10nm are blended at a ratio of 2%, and then the spinning voltage is further reduced to prepare thick fibers with an average diameter of 5-10 μm and an area density of 10g / m2. It is used to make the outer support ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Basis weightaaaaaaaaaa
diameteraaaaaaaaaa
Login to view more

Abstract

The invention discloses a naturally degradable nanofiber environment-friendly mask. The mask is composed of a core filter layer with a micro-nano gradient structure and mask accessory parts, wherein the core filter layer of the micro-nano gradient structure sequentially comprises an inner filter layer, a middle filter layer and an outer support layer from the inside out, the mask accessory parts comprise ear bands and a nose clip; wherein the average fiber diameter of the inner filter layer is 100-500nm, the gram weight of the inner filter layer is 0.05-5g / m<2>, the average fiber diameter of the middle filter layer is 600-900nm, the gram weight of the middle filter layer is 0.1-25g / m<2>, the fiber diameter of the outer support layer is 1-10microm, and the gram weight of the outer support layer is 5-30g / m<2>. All the materials for manufacturing the mask are degradable and green and environment-friendly materials; the mask is of a multi-layer composite structure, the core filter layer iscomposed of a micro-nanofiber membrane with a gradient structure, and the support layer is composed of degradable fiber of tens of microns. The core filter layer with the micro-nano gradient structure is prepared by adopting the electrospinning technology, in-situ polarization of polymer molecules can be realized, and the electrostatic retention capacity of the core filter layer is improved.

Description

technical field [0001] The invention relates to an environmentally friendly mask which can be completely degraded in the natural environment, belonging to the field of air filtration. Background technique [0002] Masks are important materials for the prevention of respiratory infectious diseases, smog protection, toxic gas protection and industrial dust protection, and consume a lot. Existing mouth mask mainly adopts polypropylene material. The inner and outer layers of the mask are spunbonded polypropylene fiber membranes, which mainly play a supporting role; the middle layer is a melt-blown polypropylene fiber membrane treated with electret charging, which mainly plays a barrier role. Polypropylene material is smelted from petrochemical industry. Below 80°C, it has strong acid and alkali resistance and bacterial corrosion resistance. It takes a long time to naturally degrade in the atmospheric environment. The main material of "white pollution" that has attracted worldw...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A41D13/11A41D31/02A41D31/30A41H43/04D01F1/10D01F6/62
CPCA41D13/11A41D31/02A41D31/305A41H43/04D01F1/103D01F6/625
Inventor 安瑛王小静杨卫民李好义陈明军张超丁玉梅
Owner BEIJING UNIV OF CHEM TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products