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A Photoelectric Monolithic Integrated System Based on Multi-material System

A monolithic integration, multi-material technology, applied in optics, light guides, optical components, etc., can solve the problems of high cost of monolithic integration of indium phosphide, large loss of silicon-based modulators, and difficulty in large-scale integration, and achieve excellent electro-optical performance. performance, improved performance, effects of low polarization sensitivity

Active Publication Date: 2021-07-27
SHANGHAI JIAOTONG UNIV
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  • Claims
  • Application Information

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Problems solved by technology

However, the shortcomings of these two material platforms are: silicon-based monolithic integration is difficult to integrate active devices such as light sources, silicon-based modulators have large losses and high half-wave voltages; indium phosphide monolithic integration costs are high, and it is difficult to achieve large-scale integrated

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  • A Photoelectric Monolithic Integrated System Based on Multi-material System
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  • A Photoelectric Monolithic Integrated System Based on Multi-material System

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Embodiment Construction

[0046] The following is a detailed description of the embodiments of the present invention: this embodiment is implemented on the premise of the technical solution of the present invention, and provides detailed implementation methods and specific operation processes. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present invention, and these all belong to the protection scope of the present invention.

[0047] An embodiment of the present invention provides a photoelectric monolithic integrated system based on a multi-material system, including: a silicon substrate layer, a lithium niobate thin film layer, a silicon nitride thin film layer and a silicon thin film layer, an indium phosphide thin film layer, and a germanium thin film layer . Between the silicon substrate layer and the lithium niobate thin film layer, between the lithium niobate thin film layer and the silicon nitride thi...

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Abstract

The invention provides a photoelectric monolithic integrated system based on a multi-material system, the system includes an indium phosphide-silicon laser, a silicon passive photonic device, a silicon nitride passive photonic device, and a silicon nitride-lithium niobate electro-optic modulator The germanium-silicon detector and the electronic circuit are integrated on the same substrate, which is used to reduce the size of the optoelectronic system, reduce the electrical and optical interconnection distance, thereby greatly reducing the adverse effects of parasitic parameters on the integrated system; avoiding the optical path The packaging between the module and the circuit module reduces the packaging cost. Take advantage of the excellent electro-optical performance of lithium niobate material, low loss, low polarization sensitivity, high process tolerance and high refractive index of silicon nitride material to realize a monolithic optoelectronic integrated system with excellent performance.

Description

technical field [0001] The invention relates to the technical field of monolithic photoelectric heterogeneous integration, in particular to a photoelectric monolithic integration system based on a multi-material system. Background technique [0002] The optoelectronic system combines the transmission advantages of light and the processing advantages of electricity, and can realize high-speed signal transmission and processing. The integration of optoelectronic systems can be realized by hybrid integration technology or heterogeneous integration technology. Hybrid integration is the integration of optoelectronic devices and electronic devices through packaging technology. Compared with hybrid integration, optoelectronic monolithic integration technology greatly reduces system volume, power consumption, parasitic parameters and packaging costs by integrating optoelectronic devices, electronics and electronic circuits on the same substrate, and finally achieves high-speed, hig...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/035G02F1/03G02B6/12G02B6/42
CPCG02B6/12G02B6/42G02B2006/12035G02B2006/1204G02B2006/12061G02B2006/12142G02B2006/12147G02B2006/12159G02B2006/12164G02F1/0327G02F1/035
Inventor 邹卫文王静徐绍夫
Owner SHANGHAI JIAOTONG UNIV
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