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Preparation method and application of graphene film substrate

A graphene film and quartz substrate technology, applied in the field of nanomaterials, can solve the problems of destroying the light transmittance of the quartz surface, uneven surface morphology, and large damage to the quartz surface, and achieves strong chemical activity, less hybridization, and reduced cracking. The effect of reaction temperature

Pending Publication Date: 2020-10-02
XIAN UNIV OF POSTS & TELECOMM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, the method of scraping is commonly used to obtain nanoparticles, but the friction between the sandpaper and the quartz will cause great damage to the quartz surface, which will destroy the original light transmittance of the quartz surface, and the resulting surface morphology will be uneven

Method used

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  • Preparation method and application of graphene film substrate
  • Preparation method and application of graphene film substrate
  • Preparation method and application of graphene film substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] The present embodiment provides a kind of preparation method of graphene film substrate, comprises the following steps:

[0033] Step S1, pretreating the quartz substrate; placing the quartz substrate in acetone, absolute ethanol and deionized water in sequence for ultrasonic cleaning, each process lasts for 15 minutes. The role of acetone is to remove the grease on the surface of the quartz substrate. Absolute ethanol is an effective dispersant, which can clean and disperse the soluble impurities and residual acetone on the surface of the substrate, and then use deionized water to ultrasonically clean it to obtain a clean of quartz substrates.

[0034] Step S2, placing the pretreated quartz substrate on the magnetron sputtering target base, and forming SiO on the quartz substrate by magnetron sputtering 2 Nanoparticles; the magnetron sputtering process includes: feeding argon 50sccm, oxygen 10sccm, turning on the magnetron sputtering, setting the sputtering power to 1...

Embodiment 2

[0037] The quartz substrate that the present invention makes is put into the PECVD furnace and carries out the preparation of graphene thin film, and heating rate is 30 ℃ / min, and argon flow rate is 100 sccm, and growth time is 20min; Growth temperature is 800 degree, injected C 2 h 2 / H 2 = 30 / 20 sccm.

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Abstract

The invention discloses a preparation method of a graphene film substrate. The method comprises the following steps: S1, pretreating a quartz substrate; S2, placing the pretreated quartz substrate ona magnetron sputtering target base, and forming SiO2 nanoparticles on the quartz substrate by adopting a magnetron sputtering method; and S3, putting the quartz substrate subjected to magnetron sputtering treatment into an annealing furnace, and carrying out annealing treatment under the condition of air flow. The invention also discloses a graphene film prepared from the graphene film substrate prepared by the method, the method avoids the problem of nonuniform SiO2 nanoparticles generated by polishing, and the prepared graphene film has the advantages of few defects, less sp3 hybridization,higher film quality and lower resistance.

Description

technical field [0001] The invention belongs to the field of nanomaterials, and in particular relates to a preparation method and application of a graphene film substrate. Background technique [0002] Graphene is a two-dimensional crystalline material with a hexagonal honeycomb structure and only a single atomic layer thickness composed of carbon atoms hybridized through sp2 orbitals. Graphene has excellent physical and chemical properties, such as submicron carriers at room temperature Mean free path, high carrier mobility, fractional quantum Hall effect, high light transmittance and mechanical strength, etc. [0003] The substrate plays a very important role in the growth of graphene, mainly in three aspects: the ability of the substrate to catalyze the cracking of carbon sources, the ability of carbon migration on the substrate, and the ability of graphene to nucleate on the substrate. Compared with metals, the glass surface is dominated by directional and saturated cov...

Claims

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Application Information

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IPC IPC(8): B81B7/04B81C1/00
CPCB81B7/04B81C1/00023B81C1/00349
Inventor 苗瑞霞王少青赵晨鹤束体康
Owner XIAN UNIV OF POSTS & TELECOMM