Integrated method for hydrophobic modification of copper surface
A hydrophobic modification and copper surface technology, which is applied to surface polishing machine tools, machine tools suitable for grinding the edge of workpieces, metal processing equipment, etc., can solve the problem of difficult quantitative control of friction, so as to improve utilization rate and avoid environmental pollution. Pollution, the effect of simple preparation process
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Embodiment 1
[0047] A kind of binary low surface energy material of hydrophobic film on copper surface, by 0.10g silicon dioxide (SiO 2 ), 10 mL of dodecyltrimethoxysilane (DTMS).
[0048] Take the bare copper sheet of the same specification and soak it in the mixed solution of 0.10g of silicon dioxide and 10mL of dodecyltrimethoxysilane (DTMS) as the control group.
[0049] Such as figure 1 As shown, it is a schematic diagram of assembling the experimental device. The experimental device includes a centrifuge tube 1 containing a solution 2 and a copper electrode sheet 3. The copper sheet is polished by a rotary grinding device. Each centrifuge tube There is a copper plate inside.
[0050] Using the above-mentioned rotary grinding experimental device, the hydrophobic modification method of copper surface is as follows:
[0051] (1) Rinse the surface of the copper substrate twice with ethanol and deionized water respectively with the pure copper electrode sheet, so that there is no resid...
Embodiment 2
[0057] A kind of binary low surface energy material of hydrophobic film on copper surface, by 0.10g silicon dioxide (SiO 2 ), 10 mL of dodecyltrimethoxysilane (DTMS).
[0058] Take the bare copper sheet of the same specification and soak it in the mixed solution of 0.10g of silicon dioxide and 10mL of dodecyltrimethoxysilane (DTMS) as the control group.
[0059] Such as figure 1 As shown, it is a schematic diagram of assembling the experimental device. The experimental device includes a centrifuge tube 1 containing a solution 2 and a copper electrode sheet 3. The copper sheet is polished by a rotary grinding device. Each centrifuge tube There is a copper plate inside.
[0060] Using the above-mentioned rotary grinding experimental device, the hydrophobic modification method of copper surface is as follows:
[0061] (1) Rinse the surface of the copper substrate twice with ethanol and deionized water respectively with the pure copper electrode sheet, so that there is no resid...
Embodiment 3
[0067] A kind of binary low surface energy material of hydrophobic film on copper surface, by 0.10g silicon dioxide (SiO 2 ), 10 mL of dodecyltrimethoxysilane (DTMS).
[0068] Take the bare copper sheet of the same specification and soak it in the mixed solution of 0.10g of silicon dioxide and 10mL of dodecyltrimethoxysilane (DTMS) as the control group.
[0069] Such as figure 1 As shown, it is a schematic diagram of assembling the experimental device. The experimental device includes a centrifuge tube 1 containing a solution 2 and a copper electrode sheet 3. The copper sheet is polished by a rotary grinding device. Each centrifuge tube There is a copper plate inside.
[0070] Using the above-mentioned rotary grinding experimental device, the hydrophobic modification method of copper surface is as follows:
[0071] (1) Rinse the surface of the copper substrate twice with ethanol and deionized water respectively with the pure copper electrode sheet, so that there is no resid...
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