Production method and production device of silicon carbide single crystal
A silicon carbide single crystal, manufacturing device technology, applied in chemical instruments and methods, single crystal growth, single crystal growth, etc., can solve problems such as wafer cracks, SiC single crystal ingot cracks, cracks, etc., to suppress cracks or cracks , the effect of small residual strain
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[0061] Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated more concretely, this invention is not limited to these.
[0062] (Example)
[0063] According to the manufacturing method of silicon carbide single crystal of the present invention, using figure 2 The silicon carbide single crystal manufacturing apparatus 1 shown grows a SiC single crystal having a diameter of 4 inches (100 mm) under the following growth conditions.
[0064]
[0065] Seed crystal substrate···SiC single crystal substrate with a diameter of 4 inches (100mm) whose main surface is inclined 4° from the {0001} plane to the direction
[0066] Growth temperature...2200℃
[0067] Pressure···10Torr(1.3×10hPa)
[0068] Atmosphere...Argon, Nitrogen
[0069] according to figure 1 In the procedure shown, when the grown SiC single crystal is cooled, the hole 9 for temperature measurement is closed with the shielding member 10, and five SiC single crystal ...
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