Resin composition, and prepreg, insulating film, metal foil-clad laminate and printed circuit board having same
A resin composition, prepreg technology, applied in metal layered products, printed circuits, printed circuit parts, etc., can solve the problems affecting the water absorption rate of the final cured product, achieve excellent heat resistance, improve crosslinking density, low The effect of water absorption
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Synthetic example 1
[0101] Synthesis Example 1: Synthesis of Dicyclopentadienyl Active Ester Compound
[0102] Take dicyclopentadienol resin and benzenedicarboxylic acid, stir and dissolve in toluene solvent evenly, at the temperature of 60°C, feed nitrogen at the same time, add tetrabutylammonium bromide catalyst, and then slowly drop in the concentration of 20% aqueous sodium hydroxide solution, reacted for 4 hours, then added p-aminophenol, continued the reaction for 2 hours, after the reaction was completed and washed several times, dried for 5 hours under vacuum at 105°C to obtain the dicyclopentadiene The base active ester compound is denoted as active ester A.
Synthetic example 2
[0103] Synthesis Example 2: Synthesis of Tricyclopentadienyl Active Ester Compound
[0104] Take tricyclopentadienol resin and benzenedicarboxylic acid, stir and dissolve in toluene solvent evenly. 20% sodium hydroxide aqueous solution, reacted for 4 hours, then added p-aminophenol, continued to react for 2 hours, and after the reaction was completed, after several washings, dried for 5 hours under vacuum at 105°C to obtain the tricyclic Pentadienyl active ester compound, denoted as active ester B.
Synthetic example 3
[0105] Synthesis example 3: Synthesis of naphthyl active ester compound
[0106] Take naphthol resin and benzenedicarboxylic acid, stir and dissolve in toluene solvent evenly, under the temperature condition of 60°C, feed nitrogen gas at the same time, add tetrabutylammonium bromide catalyst, and then slowly drop hydrogen with a concentration of 20% Sodium oxide aqueous solution was reacted for 4 hours, then p-aminophenol was added, and the reaction was continued for 2 hours. After the reaction was completed, after several washings, it was dried for 5 hours under vacuum at 105°C to obtain the naphthyl active ester compound. For the active ester C.
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