Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Moisturizing mask containing nano magnetic array particles and preparation method of moisturizing mask

A nano-array and nano-magnetic technology, applied in medical preparations containing active ingredients, magnetic therapy, skin care preparations, etc., can solve problems such as insufficient absorbability, and achieve the effects of enhancing activity, promoting absorption, and promoting penetration

Pending Publication Date: 2020-12-22
青岛姿之妍化妆品科技有限责任公司
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to solve the problem of insufficient absorbability in the existing facial mask products, the present invention provides a moisturizing facial mask containing nano-magnetic array particles that can effectively promote the skin's absorption of various nutrients and moisture in the facial mask and its preparation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A water replenishing and moisturizing facial mask containing nano magnetic array particles, the preparation method of which comprises the following three steps:

[0027] 1. Preparation of Nanomagnetic Array Particles

[0028] Sodium borohydride (NaBH 4 ) and the aqueous solution of ferric chloride with a concentration of 30g / L are mixed according to the volume ratio of 1:1, and the pH value of the mixed solution is adjusted to 14 with sodium hydroxide, and then the mixed solution is placed in the reaction kettle, and passed through the reaction A NdFeB permanent magnet is installed on the upper and lower parts of the reactor to apply an external magnetic field with a magnetic field strength of 0.28T along the vertical direction of the reactor, and then conduct a hydrothermal reaction at 180°C for 18 hours to obtain a one-dimensional chain structure Fe 3 o 4 Nano-array particles, after the reaction is completed, naturally cool to room temperature, and then use the NdF...

Embodiment 2

[0036] A water replenishing and moisturizing facial mask containing nano magnetic array particles, the preparation method of which comprises the following three steps:

[0037] 1. Preparation of Nanomagnetic Array Particles

[0038] Sodium borohydride (NaBH 4) and the aqueous solution of ferric chloride with a concentration of 35g / L are mixed according to the volume ratio of 1:1, and the pH value of the mixed solution is adjusted to 13 with sodium hydroxide, then the mixed solution is placed in the reaction kettle, and passed through the reaction A NdFeB permanent magnet is installed on the upper and lower parts of the reactor to apply an external magnetic field with a magnetic field strength of 0.35T along the vertical direction of the reactor, and then conduct a hydrothermal reaction at 180°C for 22 hours to obtain a one-dimensional chain structure Fe 3 o 4 Nano-array particles, after the reaction is completed, naturally cool to room temperature, and then use the NdFeB pe...

Embodiment 3

[0046] A water replenishing and moisturizing facial mask containing nano magnetic array particles, the preparation method of which comprises the following three steps:

[0047] 1. Preparation of Nanomagnetic Array Particles

[0048] Sodium borohydride (NaBH 4 ) and the aqueous solution of ferric chloride with a concentration of 40g / L are mixed according to the volume ratio of 1:1, and the pH value of the mixed solution is adjusted to 14 with sodium hydroxide, then the mixed solution is placed in the reaction kettle, and passed through the reaction A NdFeB permanent magnet is installed on the upper and lower parts of the reactor to apply an external magnetic field with a magnetic field strength of 0.4T along the vertical direction of the reactor, and then conduct a hydrothermal reaction at 180°C for 25 hours to obtain a one-dimensional chain structure Fe 3 o 4 Nano-array particles, after the reaction is completed, naturally cool to room temperature, and then use the NdFeB pe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a moisturizing mask containing nano magnetic array particles and a preparation method of the moisturizing mask. In the preparation process, Fe3O4 nano array particles of a one-dimensional chain structure are prepared in advance under the action of an external magnetic field, then the Fe3O4 nano array particles are evenly and directionally distributed on a carbon fiber maskbase material in an array mode under the action of the external magnetic field, and finally mask liquid is injected into the mask base material. A mask product obtained by the method can fully utilize the uniform magnetic field effect generated by the nano magnetic array particles to promote the repair and regeneration of subcutaneous tissues on the inner side of skin, and extra external magneticfield equipment is not needed. Meanwhile, a uniform magnetic field generated by the nano magnetic array particles is beneficial to promoting permeation of nutritional ingredients in the mask liquid to the skin, so that the effect of increasing uniform absorption of the nutritional ingredients by the skin is achieved.

Description

technical field [0001] The invention relates to the field of facial masks, in particular to a moisturizing facial mask containing nano magnetic array particles and a preparation method thereof. Background technique [0002] With the development of society, people's life rhythm is getting faster and faster, people's negative reactions to fast-paced life and heavy work pressure will be reflected in physical health over time, among which, the most intuitive and obvious It is the surface of the skin, which is mainly reflected in the dryness of the skin surface due to the loss of moisture, the aging of the skin, wrinkles, and spots. [0003] In order to alleviate the negative impact of life and work pressure on the body, applying facial masks has become a common method for most women to maintain their skin. There are many kinds of facial mask products on the market, but most of the existing facial masks utilize the direct absorption of skin self for the nutrient solution in the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/02A61K8/19A61N2/08A61Q19/00A61K8/891A61K8/64A61K8/73A61K8/34
CPCA61K8/0212A61K8/19A61K8/891A61K8/345A61K8/735A61K8/64A61N2/002A61Q19/00A61N2/06A61K2800/5922A61K2800/805Y02A50/30
Inventor 张洁
Owner 青岛姿之妍化妆品科技有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com