Efficient SPP coupler and manufacturing method thereof
A coupler and high-efficiency technology, which is applied in the direction of instruments, light guides, optics, etc., can solve the problems of high equipment requirements and complicated preparation process, and achieve the effect of simple and easy manufacturing method, high process compatibility, and improved SPP coupling efficiency
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Embodiment 1
[0020]Such asfigure 1 As shown, the high-efficiency SPP coupler of this embodiment mainly includes: a substrate 11, a metal thin film layer 12, a dielectric thin film layer 13, a dielectric grating layer 21, and an asymmetric metal grating structure 41; the metal thin film layer 12 is connected to the substrate 11, The dielectric film layer 13 is connected to the metal film layer 12, the dielectric grating layer 21, and the asymmetric metal grating structure 41 respectively.
[0021]Specifically, the substrate is quartz, mica, PDMS, sapphire or other materials with high transmittance in the range of 300-1600nm; the metal thin film layer separates the substrate and the dielectric thin film layer, such asfigure 2 As shown; the dielectric film layer separates the metal film layer and the dielectric grating layer, such asimage 3 As shown; the dielectric film layer separates the metal film layer and the asymmetric metal grating structure, and the refractive index of the dielectric film laye...
Embodiment 2
[0026]As shown in Figure 4, the high-efficiency SPP coupler of this embodiment mainly includes: a substrate 11, a metal thin film layer 12, a dielectric thin film layer 13, a dielectric grating layer 21, an asymmetric metal grating structure 41; a metal thin film layer 12 and The substrate 11 is connected, and the dielectric thin film layer 13 is connected to the metal thin film layer 12, the dielectric grating layer 21, and the asymmetric metal grating structure 41, respectively.
[0027]Specifically, the substrate is quartz, mica, PDMS, sapphire or other materials with high transmittance in the range of 300-1600nm; the metal thin film layer separates the substrate and the dielectric thin film layer; the dielectric thin film layer separates the metal thin film layer and the dielectric grating Layer separation; the dielectric film layer separates the metal film layer from the asymmetric metal grating structure, and the refractive index of the dielectric film layer is between 1.4 and 2....
Embodiment 3
[0034]In this embodiment, by forming a dielectric film with a thickness of 5-50 nm, the specific steps of the method for preparing the high-efficiency SPP coupler of the present invention are as follows:
[0035]S11. A nickel-gold (Ni / Au) film layer with a thickness of 5 nm or 50 nm is sequentially formed on the quartz substrate by magnetron sputtering.
[0036]S12. SiO with a thickness of 50nm is formed by magnetron sputtering on the nickel-gold (Ni / Au) film layer2Dielectric film layer.
[0037]S13, in SiO2A photoresist with a thickness of 200 nm is formed on the surface of the dielectric film layer by a spin coating method and dried.
[0038]S14, forming a photoresist grating layer by double-beam interference exposure and development or nanoimprinting, and then forming a photoresist dielectric grating layer by dry etching. Among them, the grating period is 550 nm, and the grating strip width is 200 nm.
[0039]S15, the quartz substrate, nickel gold (Ni / Au) film layer, SiO2The sample formed by th...
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Abstract
Description
Claims
Application Information
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