Moisturizing mask and preparation method thereof
A technology for wet face and facial mask, applied in the field of moisturizing facial mask and its preparation, can solve the problems of small molecular weight, weak moisturizing effect, etc., and achieve the effects of low production cost, keeping skin hydrated, and good water solubility.
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[0028] The present invention also provides a kind of preparation method of above-mentioned moisturizing facial mask, comprises the preparation of facial mask base material and moisturizing skin care lotion, is characterized in that, the present invention also provides a kind of preparation method of above-mentioned moisturizing facial mask, comprises the preparation method of facial mask base material and moisturizing skin care lotion Preparation, it is characterized in that, the preparation method of described moisturizing skin care liquid comprises the following steps:
[0029] S1: Prepare the raw materials according to the raw material ratio of the moisturizing skin care lotion, and disperse the thickener, hyaluronic acid, and sclerotin with polyol and glycerin for later use;
[0030] S2: Add part of the humectant, dipotassium glycyrrhizinate, allantoin, methylparaben, p-hydroxyacetophenone and deionized water into the main pot, add the raw materials prepared in the step S1 ...
Embodiment 1
[0037] A moisturizing facial mask, comprising a moisturizing skin care solution and a mask substrate, the moisturizing skin care solution comprising the following components by mass percentage: icodextrin 0.01%, allantoin 0.5%, propylene glycol 5%, glycerin 2%, hyaluronic acid Sodium phosphate 0.05%, carbomer 0.05%, triethanolamine 0.05%, purslane extract 0.05%, dipotassium glycyrrhizinate 0.1%, trehalose 0.05%, 1,2-hexanediol 0.5%, ethylhexylglycerin 0.1%, vitex extract 0.5%, phenoxyethanol 0.7%, water-soluble ceramide 0.1%, essence 0.01%, and the balance is deionized water.
[0038] The preparation method of above-mentioned moisturizing skin care liquid comprises the following steps:
[0039] S1: Prepare raw materials according to the raw material ratio of moisturizing skin care lotion, disperse carbomer and sodium hyaluronate with propylene glycol and glycerin for later use;
[0040]S2: Add allantoin, dipotassium glycyrrhizinate, trehalose and deionized water into the main...
Embodiment 2
[0046] A moisturizing facial mask, comprising a moisturizing skin care solution and a mask substrate, the moisturizing skin care solution comprising the following components by mass percentage: icodextrin 0.1%, allantoin 0.5%, propylene glycol 5%, glycerin 2%, hyaluronic acid Sodium phosphate 0.05%, carbomer 0.05%, triethanolamine 0.05%, purslane extract 0.05%, dipotassium glycyrrhizinate 0.1%, trehalose 0.05%, 1,2-hexanediol 0.5%, ethylhexylglycerin 0.1%, vitex extract 0.5%, phenoxyethanol 0.7%, water-soluble ceramide 0.1%, essence 0.01%, and the balance is deionized water.
[0047] The preparation method of above-mentioned moisturizing skin care liquid comprises the following steps:
[0048] S1: Prepare the raw materials according to the raw material ratio of the moisturizing skin care lotion, disperse the carbomer and sodium hyaluronate with propylene glycol, and disperse the propylene glycol and glycerin for the spare;
[0049] S2: Add allantoin, dipotassium glycyrrhizina...
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