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Low-pressure chamber high-frequency micro-vibration wetting coating method and equipment

A low-pressure chamber, high-frequency technology, applied in the field of low-pressure chamber high-frequency micro-vibration wetting coating method and equipment, can solve the problems of film interface defects, interface bubble inclusions, etc., to suppress involvement and inclusion, improve coating The effect of coating speed and coating quality

Pending Publication Date: 2021-03-12
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to overcome the shortcomings of the above-mentioned prior art, the object of the present invention is to provide a low-voltage chamber high-frequency micro-vibration wetting coating method and equipment to solve the problem of rapid preparation of large-area perovskite solar cell films in the current preparation process. The technical problem of film interface defects caused by the introduction of interfacial bubbles

Method used

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  • Low-pressure chamber high-frequency micro-vibration wetting coating method and equipment

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Effect test

Embodiment 1

[0047] 1) Using DMF as a solvent, prepare CH with a concentration of 50% by mass 3 NH 3 PB 3 Solution, under the chamber pressure of 1000Pa, the vibration frequency is 100kHz, the amplitude is 20nm, and a liquid film with a thickness of about 1000nm is prepared at a speed of 45mm / s on the glass conductive substrate FTO with a substrate fluctuation of 250nm by the slit coating method ;

[0048] 2) The liquid film is quickly dried at 10°C by air extraction method;

[0049] 3) Place the dried film on a hot plate at 70° C. for 15 minutes to obtain a transparent dark brown perovskite film on the glass conductive substrate FTO.

Embodiment 2

[0051] 1) Using DMSO as a solvent, prepare CH(NH with a mass percentage concentration of 40% 2 ) 2 PB 3 Solution, under the chamber pressure of 5000Pa, the vibration frequency is 150kHz, the amplitude is 15nm, and a layer of liquid film with a thickness of about 2000nm is prepared at a speed of 35mm / s on the glass conductive substrate ITO with a substrate fluctuation of 200nm by a spray deposition method;

[0052] 2) Using the air knife method, the liquid film is quickly dried at 30°C;

[0053] 3) The dried film was placed on a hot plate at 100° C. for 10 minutes, and a transparent dark brown perovskite film was obtained on the glass conductive substrate ITO.

Embodiment 3

[0055] 1) Using chlorobenzene as a solvent, prepare a PCBM solution with a mass percentage concentration of 5%. Under the chamber pressure of 10000Pa, the vibration frequency is 200kHz, the amplitude is 40nm, and the perovskite film is 500nm on the substrate by scraping method Prepare a liquid film with a thickness of about 3000nm at a speed of 50mm / s;

[0056] 2) The liquid film is quickly dried at 50°C by air extraction method;

[0057] 3) Place the dried film on a hot plate at 120° C. for 8 minutes to obtain a transparent and bright dark brown film on the perovskite film.

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Abstract

The invention discloses a low-pressure chamber high-frequency micro-vibration wetting coating method and equipment, and belongs to the technical field of material science and technology and thin filmpreparation. The method comprises the following steps: (1) placing a solar cell substrate in a closed chamber with the pressure of 1,000 Pa-5,0000 Pa; 2) coating the surface of a solar cell substratewith the coating substance, and performing normal vibration on the solar cell substrate by using a vibration source with the frequency of 20-200KHz and the amplitude of 10nm-100nm to form a liquid film on the surface of the solar cell substrate; and 3) drying and annealing the liquid film on the surface of the solar cell substrate to form a wet coating film on the surface of the solar cell substrate. According to the method, under the action of high-frequency micro-vibration, the perovskite solution or sol has a dynamic wetting effect on an undulating interface of the pit of the solar cell substrate, bubbles at the pit are effectively discharged and infiltrated into the pit, uncovered holes between the perovskite film and the solar cell substrate are greatly reduced, and the coating speedand the coating quality of the perovskite solution can be greatly improved.

Description

technical field [0001] The invention belongs to the field of material science technology and film preparation technology, relates to the preparation of a large-area film by a solution method and its application in a perovskite solar cell, and specifically relates to a low-voltage chamber high-frequency micro-vibration wetting film coating method and equipment. Background technique [0002] With people's emphasis on energy and environmental issues, solar energy has become an important direction for the utilization and development of clean energy. In recent years, in the field of photovoltaics, light-absorbing materials with a perovskite structure have attracted widespread attention due to their convenient solution preparation methods, suitable and adjustable bandgap widths, and excellent carrier transport properties. In the past ten years, the conversion efficiency of perovskite solar cells has improved by leaps and bounds since the first discovery of 3.9% efficiency in 2009....

Claims

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Application Information

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IPC IPC(8): H01L51/48H01L51/42
CPCH10K71/12H10K71/40H10K30/10Y02E10/549
Inventor 杨冠军刘梅军张高刘研李长久
Owner XI AN JIAOTONG UNIV
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